Abstract
Researchers at Arizona State University have invented new developer solutions for electron sensitive poly methyl-methacrylate photoresists. Improvements in contrast of up to 50% with 15% lower concentrations have been demonstrated. These new developer solutions are comprised of a mixture of chemicals which have been use individually in the past but but none of them alone will compete in performance with the unique compositions taught in this new invention.These new developers could lead to the fabrication of denser and smaller patterns in integrated circuits resulting in higher yields, less expensive devices and faster operation. Please see US Patent #4,877,716 for more details.
| Original language | English (US) |
|---|---|
| State | Published - Jan 1 1900 |