DEVELOPER SOLUTIONS FOR PMMA ELECTRON RESIST

David Ferry (Inventor)

Research output: Patent

Abstract

Researchers at Arizona State University have invented new developer solutions for electron sensitive poly methyl-methacrylate photoresists. Improvements in contrast of up to 50% with 15% lower concentrations have been demonstrated. These new developer solutions are comprised of a mixture of chemicals which have been use individually in the past but but none of them alone will compete in performance with the unique compositions taught in this new invention.These new developers could lead to the fabrication of denser and smaller patterns in integrated circuits resulting in higher yields, less expensive devices and faster operation. Please see US Patent #4,877,716 for more details.
Original languageEnglish (US)
StatePublished - Jan 1 1900

Fingerprint

photographic developers
inventions
electrons
patents
photoresists
polymethyl methacrylate
integrated circuits
low concentrations
fabrication

Cite this

DEVELOPER SOLUTIONS FOR PMMA ELECTRON RESIST. / Ferry, David (Inventor).

Research output: Patent

Ferry D, inventor. DEVELOPER SOLUTIONS FOR PMMA ELECTRON RESIST. 1900 Jan 1.
@misc{f1b9c6a8f5b3456cad2a420ce3bb3f6c,
title = "DEVELOPER SOLUTIONS FOR PMMA ELECTRON RESIST",
abstract = "Researchers at Arizona State University have invented new developer solutions for electron sensitive poly methyl-methacrylate photoresists. Improvements in contrast of up to 50{\%} with 15{\%} lower concentrations have been demonstrated. These new developer solutions are comprised of a mixture of chemicals which have been use individually in the past but but none of them alone will compete in performance with the unique compositions taught in this new invention.These new developers could lead to the fabrication of denser and smaller patterns in integrated circuits resulting in higher yields, less expensive devices and faster operation. Please see US Patent #4,877,716 for more details.",
author = "David Ferry",
year = "1900",
month = "1",
day = "1",
language = "English (US)",
type = "Patent",

}

TY - PAT

T1 - DEVELOPER SOLUTIONS FOR PMMA ELECTRON RESIST

AU - Ferry, David

PY - 1900/1/1

Y1 - 1900/1/1

N2 - Researchers at Arizona State University have invented new developer solutions for electron sensitive poly methyl-methacrylate photoresists. Improvements in contrast of up to 50% with 15% lower concentrations have been demonstrated. These new developer solutions are comprised of a mixture of chemicals which have been use individually in the past but but none of them alone will compete in performance with the unique compositions taught in this new invention.These new developers could lead to the fabrication of denser and smaller patterns in integrated circuits resulting in higher yields, less expensive devices and faster operation. Please see US Patent #4,877,716 for more details.

AB - Researchers at Arizona State University have invented new developer solutions for electron sensitive poly methyl-methacrylate photoresists. Improvements in contrast of up to 50% with 15% lower concentrations have been demonstrated. These new developer solutions are comprised of a mixture of chemicals which have been use individually in the past but but none of them alone will compete in performance with the unique compositions taught in this new invention.These new developers could lead to the fabrication of denser and smaller patterns in integrated circuits resulting in higher yields, less expensive devices and faster operation. Please see US Patent #4,877,716 for more details.

M3 - Patent

ER -