Abstract
The determination of structure factor phase invariants and magnitudes from non-systematic many-beam effects in convergent-beam patterns is discussed. Non-centrosymmetric semiconductors are investigated with emphasis on the phase problem. Two-dimensional simulations using three or more beams show that a three-phase invariant may be determined from each of the numerous line intersections observed provided the three-beam coupling is non-negligible. The use of two-dimensional energy-filtered patterns for intensity registration is suggested, and an example using this technique is given.
Original language | English (US) |
---|---|
Pages (from-to) | 25-30 |
Number of pages | 6 |
Journal | Ultramicroscopy |
Volume | 26 |
Issue number | 1-2 |
DOIs | |
State | Published - 1988 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Instrumentation