Design sensitivities to variability: Extrapolations and assessments in nanometer VLSI

Yu Cao, P. Gupta, A. B. Kahng, D. Sylvester, J. Yang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

69 Citations (Scopus)

Abstract

We propose a new framework for assessing (1) the impact of process variation on circuit performance and product value, and (2) the respective returns on investment for alternative process improvements. Elements of our framework include accurate device models and circuit simulation, along with Monte-Carlo analyses, to estimate parametric yields. We evaluate the merits of taking into account such previously unconsidered phenomena as correlations among process parameters. We also evaluate the impact of process variation with respect to such relevant metrics as parametric yield at selling point, and amount of required design guardbanding. Our experimental results yield insights into the scaling of process variation impacts through the next two ITRS technology nodes.

Original languageEnglish (US)
Title of host publicationProceedings of the Annual IEEE International ASIC Conference and Exhibit
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages411-415
Number of pages5
Volume2002-January
ISBN (Print)0780374940
DOIs
StatePublished - 2002
Externally publishedYes
Event15th Annual IEEE International ASIC/SOC Conference, ASIC/SOC 2002 - Rochester, United States
Duration: Sep 25 2002Sep 28 2002

Other

Other15th Annual IEEE International ASIC/SOC Conference, ASIC/SOC 2002
CountryUnited States
CityRochester
Period9/25/029/28/02

Fingerprint

Circuit simulation
Extrapolation
Sales
Networks (circuits)

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this

Cao, Y., Gupta, P., Kahng, A. B., Sylvester, D., & Yang, J. (2002). Design sensitivities to variability: Extrapolations and assessments in nanometer VLSI. In Proceedings of the Annual IEEE International ASIC Conference and Exhibit (Vol. 2002-January, pp. 411-415). [1158094] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ASIC.2002.1158094

Design sensitivities to variability : Extrapolations and assessments in nanometer VLSI. / Cao, Yu; Gupta, P.; Kahng, A. B.; Sylvester, D.; Yang, J.

Proceedings of the Annual IEEE International ASIC Conference and Exhibit. Vol. 2002-January Institute of Electrical and Electronics Engineers Inc., 2002. p. 411-415 1158094.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Cao, Y, Gupta, P, Kahng, AB, Sylvester, D & Yang, J 2002, Design sensitivities to variability: Extrapolations and assessments in nanometer VLSI. in Proceedings of the Annual IEEE International ASIC Conference and Exhibit. vol. 2002-January, 1158094, Institute of Electrical and Electronics Engineers Inc., pp. 411-415, 15th Annual IEEE International ASIC/SOC Conference, ASIC/SOC 2002, Rochester, United States, 9/25/02. https://doi.org/10.1109/ASIC.2002.1158094
Cao Y, Gupta P, Kahng AB, Sylvester D, Yang J. Design sensitivities to variability: Extrapolations and assessments in nanometer VLSI. In Proceedings of the Annual IEEE International ASIC Conference and Exhibit. Vol. 2002-January. Institute of Electrical and Electronics Engineers Inc. 2002. p. 411-415. 1158094 https://doi.org/10.1109/ASIC.2002.1158094
Cao, Yu ; Gupta, P. ; Kahng, A. B. ; Sylvester, D. ; Yang, J. / Design sensitivities to variability : Extrapolations and assessments in nanometer VLSI. Proceedings of the Annual IEEE International ASIC Conference and Exhibit. Vol. 2002-January Institute of Electrical and Electronics Engineers Inc., 2002. pp. 411-415
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