Design sensitivities to variability: Extrapolations and assessments in nanometer VLSI

Y. Cao, P. Gupta, A. B. Kahng, D. Sylvester, J. Yang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

76 Scopus citations

Abstract

We propose a new framework for assessing (1) the impact of process variation on circuit performance and product value, and (2) the respective returns on investment for alternative process improvements. Elements of our framework include accurate device models and circuit simulation, along with Monte-Carlo analyses, to estimate parametric yields. We evaluate the merits of taking into account such previously unconsidered phenomena as correlations among process parameters. We also evaluate the impact of process variation with respect to such relevant metrics as parametric yield at selling point, and amount of required design guardbanding. Our experimental results yield insights into the scaling of process variation impacts through the next two ITRS technology nodes.

Original languageEnglish (US)
Title of host publicationProceedings - 15th Annual IEEE International ASIC/SOC Conference, ASIC/SOC 2002
EditorsJohn Chickanosky, Ram K. Krishnamurthy, P.R. Mukund
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages411-415
Number of pages5
ISBN (Electronic)0780374940
DOIs
StatePublished - 2002
Externally publishedYes
Event15th Annual IEEE International ASIC/SOC Conference, ASIC/SOC 2002 - Rochester, United States
Duration: Sep 25 2002Sep 28 2002

Publication series

NameProceedings of the Annual IEEE International ASIC Conference and Exhibit
Volume2002-January
ISSN (Print)1063-0988

Other

Other15th Annual IEEE International ASIC/SOC Conference, ASIC/SOC 2002
Country/TerritoryUnited States
CityRochester
Period9/25/029/28/02

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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