Defects in plasma-deposited a-Si: H

J. C. Knights; G. Lucovsky; R. J. Nemanich

doi:10.1016/0022-3093(79)90084-X

Defects in plasma-deposited a-Si: H

J. C. Knights, G. Lucovsky, R. J. Nemanich

Research output: Contribution to journal › Article › peer-review

225 Scopus citations

Abstract

The relationships between hydrogen vibrational spectra, electron spin densities and refractive index are investigated for a range of plasma-deposited amorphous silicon-hydrogen alloys. Results are also presented on the morphology of thick films as shown by scanning electron microscopy. A model is proposed for the structural origin of defects in these alloys based on voids that grow perpendicular to the film surface and are associated with coupled SiH₂ units.

Original language	English (US)
Pages (from-to)	393-403
Number of pages	11
Journal	Journal of Non-Crystalline Solids
Volume	32
Issue number	1-3
DOIs	https://doi.org/10.1016/0022-3093(79)90084-X
State	Published - Jan 1 1979
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Condensed Matter Physics
Materials Chemistry

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10.1016/0022-3093(79)90084-X

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title = "Defects in plasma-deposited a-Si: H",

abstract = "The relationships between hydrogen vibrational spectra, electron spin densities and refractive index are investigated for a range of plasma-deposited amorphous silicon-hydrogen alloys. Results are also presented on the morphology of thick films as shown by scanning electron microscopy. A model is proposed for the structural origin of defects in these alloys based on voids that grow perpendicular to the film surface and are associated with coupled SiH2 units.",

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N2 - The relationships between hydrogen vibrational spectra, electron spin densities and refractive index are investigated for a range of plasma-deposited amorphous silicon-hydrogen alloys. Results are also presented on the morphology of thick films as shown by scanning electron microscopy. A model is proposed for the structural origin of defects in these alloys based on voids that grow perpendicular to the film surface and are associated with coupled SiH2 units.

AB - The relationships between hydrogen vibrational spectra, electron spin densities and refractive index are investigated for a range of plasma-deposited amorphous silicon-hydrogen alloys. Results are also presented on the morphology of thick films as shown by scanning electron microscopy. A model is proposed for the structural origin of defects in these alloys based on voids that grow perpendicular to the film surface and are associated with coupled SiH2 units.

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ER -

Defects in plasma-deposited a-Si: H

Abstract

ASJC Scopus subject areas

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