Defects in plasma-deposited a-Si: H

J. C. Knights, G. Lucovsky, R. J. Nemanich

Research output: Contribution to journalArticle

203 Scopus citations

Abstract

The relationships between hydrogen vibrational spectra, electron spin densities and refractive index are investigated for a range of plasma-deposited amorphous silicon-hydrogen alloys. Results are also presented on the morphology of thick films as shown by scanning electron microscopy. A model is proposed for the structural origin of defects in these alloys based on voids that grow perpendicular to the film surface and are associated with coupled SiH2 units.

Original languageEnglish (US)
Pages (from-to)393-403
Number of pages11
JournalJournal of Non-Crystalline Solids
Volume32
Issue number1-3
DOIs
StatePublished - Jan 1 1979
Externally publishedYes

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Materials Chemistry

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