Deep-ultraviolet lasing at 243 nm from photo-pumped AlGaN/AlN heterostructure on AlN substrate

Zachary Lochner, Tsung Ting Kao, Yuh Shiuan Liu, Xiao Hang Li, Md Mahbub Satter, Shyh Chiang Shen, P. Douglas Yoder, Jae Hyun Ryou, Russell D. Dupuis, Yong Wei, Hongen Xie, Alec Fischer, Fernando Ponce

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Abstract

Deep-ultraviolet lasing was achieved at 243.5 nm from an Al xGa1-xN-based multi-quantum-well structure using a pulsed excimer laser for optical pumping. The threshold pump power density at room-temperature was 427 kW/cm2 with transverse electric (TE)-polarization-dominant emission. The structure was epitaxially grown by metalorganic chemical vapor deposition on an Al-polar free-standing AlN (0001) substrate. Stimulated emission is achieved by design of the active region, optimizing the growth, and the reduction in defect density afforded by homoepitaxial growth of AlN buffer layers on AlN substrates, demonstrating the feasibility of deep-ultraviolet diode lasers on free-standing AlN.

Original languageEnglish (US)
Article number101110
JournalApplied Physics Letters
Volume102
Issue number10
DOIs
StatePublished - Mar 11 2013

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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    Lochner, Z., Kao, T. T., Liu, Y. S., Li, X. H., Mahbub Satter, M., Shen, S. C., Douglas Yoder, P., Ryou, J. H., Dupuis, R. D., Wei, Y., Xie, H., Fischer, A., & Ponce, F. (2013). Deep-ultraviolet lasing at 243 nm from photo-pumped AlGaN/AlN heterostructure on AlN substrate. Applied Physics Letters, 102(10), [101110]. https://doi.org/10.1063/1.4795719