CV characteristics of MOS capacitors with two top capacitive contacts

I. G. McGillivray, J. M. Robertson, A. J. Walton

Research output: Contribution to journalArticlepeer-review

Abstract

Capacitive contacts can be used for the measurement of high frequency CV characteristics. This paper addresses the accuracy of this approach and demonstrates that the errors involved are considerably worse than those predicted assuming just two oxide capacitances in series. Practical measurements are presented and compared with those predicted by a theoretical model which includes the effect of depletion under the second contact. This analysis casts doubts upon the suitability of the structure for any quantitative measurements.

Original languageEnglish (US)
Pages (from-to)25-27
Number of pages3
JournalMicroelectronics Journal
Volume18
Issue number5
DOIs
StatePublished - Jan 1 1987

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'CV characteristics of MOS capacitors with two top capacitive contacts'. Together they form a unique fingerprint.

Cite this