Crystalline-to-amorphous transition in chemical vapor deposition of pseudomorphic Si1-x-yGexCy films

T. Laursen, D. Chandrasekhar, David Smith, J. W. Mayer, J. Huffman, R. Westhoff, McD Robinson

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9 Scopus citations

Abstract

Pseudomorphic SiGeC films have been grown on (100) Si by atmospheric pressure chemical vapor deposition at 600 and 700 °C using SiH2Cl2, GeH4, and C2H4 precursors. Films with C concentrations of up to 2.5 at. % were entirely pseudomorphic and a 120-nm-thick Si66.5Ge31C2.5 film had 90% substitutional carbon. With increasing C incorporation due to increased ethylene flow, a layered structure was formed consisting of an amorphous film overlaying a buried pseudomorphic film. The crystalline-to-amorphous transition was initiated by the accumulation of C on the epitaxial growth surface. This deteriorated surface resulted in the formation of stacking faults along {111} planes and subsequent amorphization. Defect formation and amorphization could be prevented by periodically growing a thin Si epilayer.

Original languageEnglish (US)
Pages (from-to)1634-1636
Number of pages3
JournalApplied Physics Letters
Volume71
Issue number12
DOIs
StatePublished - Sep 22 1997

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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    Laursen, T., Chandrasekhar, D., Smith, D., Mayer, J. W., Huffman, J., Westhoff, R., & Robinson, M. (1997). Crystalline-to-amorphous transition in chemical vapor deposition of pseudomorphic Si1-x-yGexCy films. Applied Physics Letters, 71(12), 1634-1636. https://doi.org/10.1063/1.120001