Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors

S. B. Hill, Ivan Ermanoski, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Fang, M. Chandhok

    Research output: Contribution to journalConference article

    10 Scopus citations

    Abstract

    Endurance testing of Ru-capped multilayer mirrors (MLMs) at the NIST synchrotron facility has revealed that the damage resulting from EUV irradiation in a water-dominated environment is nonlinear and may be influenced by competing oxidation and carbon-deposition processes. Concurrent results from two different environmental chambers reveal non-intuitive relationships between reflectivity loss and the admitted water-vapor partial pressure, the ambient background-gas composition, the presence or absence of hot filaments in the chamber, the EUV intensity and the irradiation dose. We discuss possible mechanisms and propose further experiments to test them. Determining the MLM lifetime from accelerated tests is a very difficult task. It is crucial that any lifetime testing procedure involves duplicate exposures for consistency, and, if possible, testing in multiple facilities.

    Original languageEnglish (US)
    Article number65170G
    JournalProceedings of SPIE - The International Society for Optical Engineering
    Volume6517
    Issue numberPART 1
    DOIs
    StatePublished - Oct 15 2007
    EventEmerging Lithographic Technologies XI - San Jose, CA, United States
    Duration: Feb 27 2007Mar 1 2007

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    Keywords

    • EUV optics
    • Extreme ultraviolet
    • Lifetime testing
    • Lithography
    • Reflectometry
    • Ruthenium films

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics
    • Computer Science Applications
    • Applied Mathematics
    • Electrical and Electronic Engineering

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