Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors

S. B. Hill, Ivan Ermanoski, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Fang, M. Chandhok

Research output: Contribution to journalConference article

10 Citations (Scopus)

Abstract

Endurance testing of Ru-capped multilayer mirrors (MLMs) at the NIST synchrotron facility has revealed that the damage resulting from EUV irradiation in a water-dominated environment is nonlinear and may be influenced by competing oxidation and carbon-deposition processes. Concurrent results from two different environmental chambers reveal non-intuitive relationships between reflectivity loss and the admitted water-vapor partial pressure, the ambient background-gas composition, the presence or absence of hot filaments in the chamber, the EUV intensity and the irradiation dose. We discuss possible mechanisms and propose further experiments to test them. Determining the MLM lifetime from accelerated tests is a very difficult task. It is crucial that any lifetime testing procedure involves duplicate exposures for consistency, and, if possible, testing in multiple facilities.

Original languageEnglish (US)
Article number65170G
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume6517
Issue numberPART 1
DOIs
StatePublished - Oct 15 2007
EventEmerging Lithographic Technologies XI - San Jose, CA, United States
Duration: Feb 27 2007Mar 1 2007

Fingerprint

Multilayer
Mirror
Multilayers
Damage
mirrors
damage
Irradiation
Testing
Lifetime
Environmental chambers
Water Vapor
Steam
Reflectivity
Filament
Vapor pressure
Synchrotrons
Oxidation
Partial pressure
Water vapor
Dosimetry

Keywords

  • EUV optics
  • Extreme ultraviolet
  • Lifetime testing
  • Lithography
  • Reflectometry
  • Ruthenium films

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors. / Hill, S. B.; Ermanoski, Ivan; Tarrio, C.; Lucatorto, T. B.; Madey, T. E.; Bajt, S.; Fang, M.; Chandhok, M.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 6517, No. PART 1, 65170G, 15.10.2007.

Research output: Contribution to journalConference article

Hill, S. B. ; Ermanoski, Ivan ; Tarrio, C. ; Lucatorto, T. B. ; Madey, T. E. ; Bajt, S. ; Fang, M. ; Chandhok, M. / Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors. In: Proceedings of SPIE - The International Society for Optical Engineering. 2007 ; Vol. 6517, No. PART 1.
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AU - Madey, T. E.

AU - Bajt, S.

AU - Fang, M.

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