Coupling of strain, stress, and oxygen non-stoichiometry in thin film Pr0.1Ce0.9O2-δ

J. Sheth, D. Chen, J. J. Kim, W. J. Bowman, Peter Crozier, H. L. Tuller, S. T. Misture, S. Zdzieszynski, B. W. Sheldon, S. R. Bishop

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

Stress and strain in thin films of Pr0.1Ce0.9O2-δ, supported on yttria stabilized zirconia (YSZ) and sapphire substrates, induced by large deviations from oxygen stoichiometry (δ = 0) were investigated by in situ high temperature X-ray diffraction and wafer curvature studies. The measured stresses and strains were correlated with change in δ, measured in situ using optical transmission spectroscopy of defect centers in the films and compared with prior chemical capacitance studies. The coefficient of chemical expansion and elastic modulus values for the films were found to be 18% less than, and 16% greater than in the bulk, respectively. Irreproducible stress and strain during cycling on YSZ substrates was observed and related to microstructural changes as observed by TEM. The enthalpy of defect formation was found to be similar for films supported on sapphire and YSZ, and appeared to decrease with tensile stress, and increase with compressive stress. Larger stresses observed for YSZ supported films as compared to sapphire supported films were found and accounted for by the difference in film orientations.

Original languageEnglish (US)
Pages (from-to)16499-16510
Number of pages12
JournalNanoscale
Volume8
Issue number36
DOIs
StatePublished - Sep 28 2016

Fingerprint

Yttria stabilized zirconia
Oxygen
Thin films
Aluminum Oxide
Sapphire
Defects
Substrates
Light transmission
Compressive stress
Tensile stress
Stoichiometry
Enthalpy
Capacitance
Elastic moduli
Spectroscopy
Transmission electron microscopy
X ray diffraction
Temperature

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Sheth, J., Chen, D., Kim, J. J., Bowman, W. J., Crozier, P., Tuller, H. L., ... Bishop, S. R. (2016). Coupling of strain, stress, and oxygen non-stoichiometry in thin film Pr0.1Ce0.9O2-δ Nanoscale, 8(36), 16499-16510. https://doi.org/10.1039/c6nr04083g

Coupling of strain, stress, and oxygen non-stoichiometry in thin film Pr0.1Ce0.9O2-δ . / Sheth, J.; Chen, D.; Kim, J. J.; Bowman, W. J.; Crozier, Peter; Tuller, H. L.; Misture, S. T.; Zdzieszynski, S.; Sheldon, B. W.; Bishop, S. R.

In: Nanoscale, Vol. 8, No. 36, 28.09.2016, p. 16499-16510.

Research output: Contribution to journalArticle

Sheth, J, Chen, D, Kim, JJ, Bowman, WJ, Crozier, P, Tuller, HL, Misture, ST, Zdzieszynski, S, Sheldon, BW & Bishop, SR 2016, 'Coupling of strain, stress, and oxygen non-stoichiometry in thin film Pr0.1Ce0.9O2-δ ', Nanoscale, vol. 8, no. 36, pp. 16499-16510. https://doi.org/10.1039/c6nr04083g
Sheth, J. ; Chen, D. ; Kim, J. J. ; Bowman, W. J. ; Crozier, Peter ; Tuller, H. L. ; Misture, S. T. ; Zdzieszynski, S. ; Sheldon, B. W. ; Bishop, S. R. / Coupling of strain, stress, and oxygen non-stoichiometry in thin film Pr0.1Ce0.9O2-δ In: Nanoscale. 2016 ; Vol. 8, No. 36. pp. 16499-16510.
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