CORRELATION OF THE AVERAGE SAMPLE MASS AND THE SPUTTERING YIELD IN SIMS.

William Katz, Peter Williams, C. A. Evans

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Previous work has shown that the sputtering yield of a matrix strongly affects the secondary ion yield of a material bombarded by reactive primary ions. A linear correlation between sputtering yield and average substrate mass was determined from examining several homologous series of compounds. This relationship enables quantitative predictions of the substrate sputtering yield and stoichiometry prior to SIMS analysis. This approach should be generally applicable to any sputtering technique.

Original languageEnglish (US)
Pages (from-to)120-121
Number of pages2
JournalSurface and Interface Analysis
Volume2
Issue number3
StatePublished - Jun 1980
Externally publishedYes

Fingerprint

Secondary ion mass spectrometry
secondary ion mass spectrometry
Sputtering
sputtering
Ions
Substrates
Stoichiometry
stoichiometry
ions
matrices
predictions

ASJC Scopus subject areas

  • Colloid and Surface Chemistry
  • Physical and Theoretical Chemistry

Cite this

CORRELATION OF THE AVERAGE SAMPLE MASS AND THE SPUTTERING YIELD IN SIMS. / Katz, William; Williams, Peter; Evans, C. A.

In: Surface and Interface Analysis, Vol. 2, No. 3, 06.1980, p. 120-121.

Research output: Contribution to journalArticle

@article{278b0b560d954392b1b7ef0684d10394,
title = "CORRELATION OF THE AVERAGE SAMPLE MASS AND THE SPUTTERING YIELD IN SIMS.",
abstract = "Previous work has shown that the sputtering yield of a matrix strongly affects the secondary ion yield of a material bombarded by reactive primary ions. A linear correlation between sputtering yield and average substrate mass was determined from examining several homologous series of compounds. This relationship enables quantitative predictions of the substrate sputtering yield and stoichiometry prior to SIMS analysis. This approach should be generally applicable to any sputtering technique.",
author = "William Katz and Peter Williams and Evans, {C. A.}",
year = "1980",
month = "6",
language = "English (US)",
volume = "2",
pages = "120--121",
journal = "Surface and Interface Analysis",
issn = "0142-2421",
publisher = "John Wiley and Sons Ltd",
number = "3",

}

TY - JOUR

T1 - CORRELATION OF THE AVERAGE SAMPLE MASS AND THE SPUTTERING YIELD IN SIMS.

AU - Katz, William

AU - Williams, Peter

AU - Evans, C. A.

PY - 1980/6

Y1 - 1980/6

N2 - Previous work has shown that the sputtering yield of a matrix strongly affects the secondary ion yield of a material bombarded by reactive primary ions. A linear correlation between sputtering yield and average substrate mass was determined from examining several homologous series of compounds. This relationship enables quantitative predictions of the substrate sputtering yield and stoichiometry prior to SIMS analysis. This approach should be generally applicable to any sputtering technique.

AB - Previous work has shown that the sputtering yield of a matrix strongly affects the secondary ion yield of a material bombarded by reactive primary ions. A linear correlation between sputtering yield and average substrate mass was determined from examining several homologous series of compounds. This relationship enables quantitative predictions of the substrate sputtering yield and stoichiometry prior to SIMS analysis. This approach should be generally applicable to any sputtering technique.

UR - http://www.scopus.com/inward/record.url?scp=0019025791&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0019025791&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0019025791

VL - 2

SP - 120

EP - 121

JO - Surface and Interface Analysis

JF - Surface and Interface Analysis

SN - 0142-2421

IS - 3

ER -