Abstract
This paper discusses the design principles underlying the controlled formation of nanostructures with desired geometries through a hybrid top-down and bottom-up approach: top-down formation of the physical domains with externally-imposed controls and bottom-up self-assembly of the nanoscale particles to form the desired structure. We propose a two-phase approach for this design problem. The first phase guarantees a robust desired structure, and the second allows the desired structure to be reachable from any initial particle distribution in the physical domain. Both phases require the solution of combinatorially-constrained quadratic optimization problems. The dynamics of the self-assembly process is described through a multiresolution view of the system. Crucial to the achievement of the design goals is the need to break the ergodicity of the system.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1713-1718 |
| Number of pages | 6 |
| Journal | Computer Aided Chemical Engineering |
| Volume | 27 |
| Issue number | C |
| DOIs | |
| State | Published - Jan 1 2009 |
| Externally published | Yes |
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Keywords
- Ergodicity breaking
- Robust nanostructures
- Self-assembly dynamics
ASJC Scopus subject areas
- Chemical Engineering(all)
- Computer Science Applications
Cite this
Controlled formation of self-assembled nanostructures with desired geometries : Robust dynamic paths to robust desired structures. / Solis, Earl O.P.; Barton, Paul I.; Stephanopoulos, George.
In: Computer Aided Chemical Engineering, Vol. 27, No. C, 01.01.2009, p. 1713-1718.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Controlled formation of self-assembled nanostructures with desired geometries
T2 - Robust dynamic paths to robust desired structures
AU - Solis, Earl O.P.
AU - Barton, Paul I.
AU - Stephanopoulos, George
PY - 2009/1/1
Y1 - 2009/1/1
N2 - This paper discusses the design principles underlying the controlled formation of nanostructures with desired geometries through a hybrid top-down and bottom-up approach: top-down formation of the physical domains with externally-imposed controls and bottom-up self-assembly of the nanoscale particles to form the desired structure. We propose a two-phase approach for this design problem. The first phase guarantees a robust desired structure, and the second allows the desired structure to be reachable from any initial particle distribution in the physical domain. Both phases require the solution of combinatorially-constrained quadratic optimization problems. The dynamics of the self-assembly process is described through a multiresolution view of the system. Crucial to the achievement of the design goals is the need to break the ergodicity of the system.
AB - This paper discusses the design principles underlying the controlled formation of nanostructures with desired geometries through a hybrid top-down and bottom-up approach: top-down formation of the physical domains with externally-imposed controls and bottom-up self-assembly of the nanoscale particles to form the desired structure. We propose a two-phase approach for this design problem. The first phase guarantees a robust desired structure, and the second allows the desired structure to be reachable from any initial particle distribution in the physical domain. Both phases require the solution of combinatorially-constrained quadratic optimization problems. The dynamics of the self-assembly process is described through a multiresolution view of the system. Crucial to the achievement of the design goals is the need to break the ergodicity of the system.
KW - Ergodicity breaking
KW - Robust nanostructures
KW - Self-assembly dynamics
UR - http://www.scopus.com/inward/record.url?scp=77649293125&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=77649293125&partnerID=8YFLogxK
U2 - 10.1016/S1570-7946(09)70676-5
DO - 10.1016/S1570-7946(09)70676-5
M3 - Article
AN - SCOPUS:77649293125
VL - 27
SP - 1713
EP - 1718
JO - Computer Aided Chemical Engineering
JF - Computer Aided Chemical Engineering
SN - 1570-7946
IS - C
ER -