Engineering & Materials Science
Ultrahigh vacuum
100%
Silicon nitride
77%
Chemical vapor deposition
74%
Plasmas
58%
Chemical analysis
41%
Deposits
25%
Nitrogen
23%
Electron cyclotron resonance
22%
Plasma enhanced chemical vapor deposition
18%
Refractive index
16%
Silanes
16%
X ray photoelectron spectroscopy
15%
Leakage currents
13%
Fluxes
10%
Hydrogen
10%
Silicon
10%
Temperature
5%
Physics & Astronomy
ultrahigh vacuum
63%
silicon nitrides
62%
vapor deposition
48%
conduction
42%
deposits
22%
nitrogen
18%
electron cyclotron resonance
13%
silanes
13%
leakage
10%
photoelectron spectroscopy
10%
refractivity
8%
hydrogen
7%
silicon
6%
x rays
5%
temperature
3%
Chemical Compounds
Nitride
61%
Chemical Vapour Deposition
57%
Liquid Film
30%
Electron Cyclotron Resonance
19%
Leakage Current
16%
Nitrogen
15%
Plasma Enhanced Chemical Vapour Deposition
15%
Refractive Index
12%
Silane
12%
X-Ray Photoelectron Spectroscopy
8%
Hydrogen
6%