Abstract
The strain in epitaxial SiGeC alloy films grown on Si(001) substrates by chemical vapor deposition (CVD) is quantified. Film composition was determined by Rutherford backscattering spectrometry (RBS) and nuclear resonance analysis. The amount of substitutional C was determined by He ion channeling near a C-resonance energy. Ion channeling angular scans and X-ray diffraction space maps were used to determine the strain in the alloys. Good agreement was found between the measured values of strain and predictions based on a simple elastic theory and Vegard's law.
Original language | English (US) |
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Pages (from-to) | 277-282 |
Number of pages | 6 |
Journal | Materials Chemistry and Physics |
Volume | 46 |
Issue number | 2-3 |
DOIs | |
State | Published - Nov 1996 |
Keywords
- Chemical vapour deposition
- Elastic theory
- Strain
- Vegard's law
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics