Abstract
Tungsten, iron and rhodium materials have been deposited alternatively with carbon and boron carbide by diode rf-sputtering. Lower interface roughnesses are found in each case using boron carbide instead of carbon, and is related to the greater tendency of boron to diffuse inside the metallic layers. This effect leads to metallic layer densities lower than expected, especially using tungsten and rhodium. The soft X-ray performances are then reduced. Fe/B 4C multilayers have nevertheless exhibit interesting reflecting properties at the boron K- α line. Some other improvement should perhaps be obtained minimizing the surface bombardment (bias on the sample, greater target-sample distance, ...), reducing the sample temperature or with other metallic materials.
Original language | English (US) |
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Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
Editors | James P. Knauer, Gopal K. Shenoy |
Publisher | Publ by Int Soc for Optical Engineering |
Pages | 165-179 |
Number of pages | 15 |
Volume | 1345 |
State | Published - 1990 |
Externally published | Yes |
Event | Advanced X-Ray/EUV Radiation Sources and Applications - San Diego, CA, USA Duration: Jul 11 1990 → Jul 13 1990 |
Other
Other | Advanced X-Ray/EUV Radiation Sources and Applications |
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City | San Diego, CA, USA |
Period | 7/11/90 → 7/13/90 |
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Condensed Matter Physics