@article{3f9fb0c75e784274931a6b6631b951ee,
title = "Chip-integrated plasmonic flat optics for mid-infrared full-Stokes polarization detection",
abstract = "Flat optics presents a new path to control the phase, amplitude, and polarization state of light with ultracompact devices. Here we demonstrate chip-integrated metasurface devices for polarization detection of mid-infrared light with arbitrary polarization states. Six high-performance microscale linear and circular polarization filters based on vertically stacked plasmonic metasurfaces (with total thickness <600 nm) are integrated on the same chip to obtain all four Stokes parameters of light with high accuracy. The device designs can be tailored to operate at any wavelength in the mid-infrared spectral region and are feasible for on-chip integration with mid-infrared (mid-IR) photodetectors and imager arrays. Our work will enable on-chip mid-IR polarimeters and polarimetric imaging systems, which are highly desirable for many applications, such as clinical diagnosis, target detection, and space exploration.",
author = "Jing Bai and Chu Wang and Xiahui Chen and Ali Basiri and Chao Wang and Yu Yao",
note = "Funding Information: Acknowledgment. The devices were fabricated in the NanoFab and Eyring Materials Center (EMC) at Arizona State University. P. Amrollahi from Arizona State University participated in the device fabrication for SiO2 sputtering. Y. Yao and C. Wang acknowledge support from Arizona State University. Funding Information: Funding. U.S. Air Force (FA9550-16-1-0183); Directorate for Engineering (1542160, 171141, 1809997); National Science Foundation (NSF) (ECCS-1542160); Arizona State University. Funding Information: U.S. Air Force (FA9550-16-1-0183); Directorate for Engineering (1542160, 171141, 1809997); National Science Foundation (NSF) (ECCS-1542160); Arizona State University. The devices were fabricated in the NanoFab and Eyring Materials Center (EMC) at Arizona State University. P. Amrollahi from Arizona State University participated in the device fabrication for SiO2 sputtering. Y. Yao and C. Wang acknowledge support from Arizona State University. Publisher Copyright: {\textcopyright} 2019 Chinese Laser Press",
year = "2019",
doi = "10.1364/PRJ.7.001051",
language = "English (US)",
volume = "7",
pages = "1051--1060",
journal = "Photonics Research",
issn = "2327-9125",
publisher = "OSA Publishing",
number = "9",
}