Chemical vapor deposition of nickel thin films on glass using nickel acetylac etonate

Jan Gesthuizen, Antonio Huerta Miguelanez, Frank Reilmann, Robert Ros, Naoufal Bahlawane

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

The effect of the control parameters during the deposition of nickel thin films from Ni(acac)2 has been systematically investigated and films have been characterized using AFM, EDX, XRD and conductivity measurements. Screening of the precursor temperature and the flow rate of the carrier gas reveals a narrow range where conductive metallic films can be deposited. The investigation of the time-dependent deposition shows a slow heterogeneous nucleation of nickel on glass, and the effect of various parameters on the observed incubation time has been investigated. The most significant influence was observed when the carrier gas was used in a pulsed manner, which allows a significant reduction of the incubation time and increases the deposition rate.

Original languageEnglish (US)
Title of host publicationProceedings - Electrochemical Society
EditorsA. Devi, R. Fischer, H. Parala, M.D. Allendorf, M. Hitchman
Pages659-666
Number of pages8
VolumePV 2005-09
Publication statusPublished - 2005
Externally publishedYes
Event15th European Conference on Chemical Vapor Deposition, EUROCVD-15 - Bochum, Germany
Duration: Sep 5 2005Sep 9 2005

Other

Other15th European Conference on Chemical Vapor Deposition, EUROCVD-15
CountryGermany
CityBochum
Period9/5/059/9/05

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ASJC Scopus subject areas

  • Engineering(all)

Cite this

Gesthuizen, J., Miguelanez, A. H., Reilmann, F., Ros, R., & Bahlawane, N. (2005). Chemical vapor deposition of nickel thin films on glass using nickel acetylac etonate. In A. Devi, R. Fischer, H. Parala, M. D. Allendorf, & M. Hitchman (Eds.), Proceedings - Electrochemical Society (Vol. PV 2005-09, pp. 659-666)