Chemical Vapor Deposition of Gallium Nitride from Diethylgallium Azide

Engineering & Materials Science

• Gallium nitride 100%
• Chemical vapor deposition 84%
• Annealing 20%
• Rutherford backscattering spectroscopy 19%
• Spectroscopic analysis 16%
• Auger electron spectroscopy 16%
• Diffraction patterns 14%
• Infrared spectroscopy 13%
• Hydrides 13%
• Ethylene 10%
• Transmission electron microscopy 10%
• Electrons 10%
• X ray diffraction 10%
• Pyrolysis 9%
• Nitrogen 9%
• Oxygen 8%
• Hydrogen 8%
• Scanning electron microscopy 8%
• Carbon 7%
• Gases 5%

Chemical Compounds

• Nitride 70%
• Azide 66%
• Chemical Vapour Deposition 65%
• Liquid Film 35%
• Annealing 16%
• Rutherford Backscattering Spectroscopy 13%
• Ethyl Group 12%
• Auger Electron Spectroscopy 11%
• Spectroscopic Analysis 10%
• Polycrystalline Solid 9%
• Hexagonal Space Group 8%
• Pyrolysis 7%
• IR Spectroscopy 7%
• Transmission Electron Microscopy 6%
• Nitrogen 6%
• Scanning Electron Microscopy 6%
• Gas 5%
• Hydrogen 5%
• Purity 5%
• X-Ray Diffraction 5%
• Dioxygen 5%
• Carbon Atom 4%