Chemical vapor deposition of diamond films from water vapor rf-plasma discharges

R. A. Rudder, G. C. Hudson, J. B. Posthill, R. E. Thomas, R. C. Hendry, D. P. Malta, R. J. Markunas, T. P. Humphreys, Robert Nemanich

Research output: Contribution to journalArticle

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Abstract

Polycrystalline diamond films have been deposited from water vapor rf-plasma discharges at 1.0 Torr containing various alcohol vapors. No other gases such as H2, F2, or Cl2 were admitted to the growth chamber. Scanning electron microscopy and Raman spectroscopy have been used to characterize the diamond films. In addition, a water-ethanol mixture has been used for homoepitaxial deposition with a full-width-half- maximum narrower than the bulk substrate (2.60 and 2.75 cm-1, respectively). This technique represents a remarkable new approach to the growth of diamond which does not depend on delivery of hydrogen, fluorine, hydrocarbon, or halocarbon gases that have been typically used by other workers. The nucleation density and topography of the polycrystalline diamond films deposited from the water alcohol mixtures are quite sensitive to the choice of alcohol. Water vapor discharges, by producing H atoms and OH radicals, become the functional equivalent to molecular H2 discharges producing H atoms characteristic of many other diamond chemical vapor deposition techniques.

Original languageEnglish (US)
Pages (from-to)329-331
Number of pages3
JournalApplied Physics Letters
Volume60
Issue number3
DOIs
StatePublished - 1992
Externally publishedYes

Fingerprint

diamond films
plasma jets
water vapor
alcohols
vapor deposition
diamonds
halocarbons
phytotrons
gases
water
fluorine
atoms
delivery
topography
ethyl alcohol
Raman spectroscopy
hydrocarbons
nucleation
vapors
scanning electron microscopy

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Rudder, R. A., Hudson, G. C., Posthill, J. B., Thomas, R. E., Hendry, R. C., Malta, D. P., ... Nemanich, R. (1992). Chemical vapor deposition of diamond films from water vapor rf-plasma discharges. Applied Physics Letters, 60(3), 329-331. https://doi.org/10.1063/1.106668

Chemical vapor deposition of diamond films from water vapor rf-plasma discharges. / Rudder, R. A.; Hudson, G. C.; Posthill, J. B.; Thomas, R. E.; Hendry, R. C.; Malta, D. P.; Markunas, R. J.; Humphreys, T. P.; Nemanich, Robert.

In: Applied Physics Letters, Vol. 60, No. 3, 1992, p. 329-331.

Research output: Contribution to journalArticle

Rudder, RA, Hudson, GC, Posthill, JB, Thomas, RE, Hendry, RC, Malta, DP, Markunas, RJ, Humphreys, TP & Nemanich, R 1992, 'Chemical vapor deposition of diamond films from water vapor rf-plasma discharges', Applied Physics Letters, vol. 60, no. 3, pp. 329-331. https://doi.org/10.1063/1.106668
Rudder RA, Hudson GC, Posthill JB, Thomas RE, Hendry RC, Malta DP et al. Chemical vapor deposition of diamond films from water vapor rf-plasma discharges. Applied Physics Letters. 1992;60(3):329-331. https://doi.org/10.1063/1.106668
Rudder, R. A. ; Hudson, G. C. ; Posthill, J. B. ; Thomas, R. E. ; Hendry, R. C. ; Malta, D. P. ; Markunas, R. J. ; Humphreys, T. P. ; Nemanich, Robert. / Chemical vapor deposition of diamond films from water vapor rf-plasma discharges. In: Applied Physics Letters. 1992 ; Vol. 60, No. 3. pp. 329-331.
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