Chemical vapor deposition of diamond films from water vapor rf-plasma discharges

R. A. Rudder, G. C. Hudson, J. B. Posthill, R. E. Thomas, R. C. Hendry, D. P. Malta, R. J. Markunas, T. P. Humphreys, R. J. Nemanich

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35 Scopus citations

Abstract

Polycrystalline diamond films have been deposited from water vapor rf-plasma discharges at 1.0 Torr containing various alcohol vapors. No other gases such as H2, F2, or Cl2 were admitted to the growth chamber. Scanning electron microscopy and Raman spectroscopy have been used to characterize the diamond films. In addition, a water-ethanol mixture has been used for homoepitaxial deposition with a full-width-half- maximum narrower than the bulk substrate (2.60 and 2.75 cm-1, respectively). This technique represents a remarkable new approach to the growth of diamond which does not depend on delivery of hydrogen, fluorine, hydrocarbon, or halocarbon gases that have been typically used by other workers. The nucleation density and topography of the polycrystalline diamond films deposited from the water alcohol mixtures are quite sensitive to the choice of alcohol. Water vapor discharges, by producing H atoms and OH radicals, become the functional equivalent to molecular H2 discharges producing H atoms characteristic of many other diamond chemical vapor deposition techniques.

Original languageEnglish (US)
Pages (from-to)329-331
Number of pages3
JournalApplied Physics Letters
Volume60
Issue number3
DOIs
StatePublished - Dec 1 1992
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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    Rudder, R. A., Hudson, G. C., Posthill, J. B., Thomas, R. E., Hendry, R. C., Malta, D. P., Markunas, R. J., Humphreys, T. P., & Nemanich, R. J. (1992). Chemical vapor deposition of diamond films from water vapor rf-plasma discharges. Applied Physics Letters, 60(3), 329-331. https://doi.org/10.1063/1.106668