Characterization and comparison of silicon nitride films deposited using two novel processes

Engineering & Materials Science

• Silicon nitride 100%
• Characterization (materials science) 72%
• Plasma enhanced chemical vapor deposition 46%
• Annealing 32%
• Spectroscopic ellipsometry 29%
• Antireflection coatings 26%
• Silicon solar cells 22%
• Solar cells 17%
• Crystalline materials 17%
• Design of experiments 15%
• Fabrication 12%

Physics & Astronomy

• silicon nitrides 80%
• characterization 45%
• solar cells 24%
• reflectance 23%
• experiment design 20%
• annealing 19%
• antireflection coatings 19%
• ellipsometry 16%
• methodology 13%
• fabrication 9%
• performance 7%

Chemical Compounds

• Nitride 79%
• Liquid Film 39%
• Annealing 25%
• Elastic Recoil Detection 25%
• Ellipsometry 18%
• Deposition Process 17%
• Solar Cell 14%
• Coating Agent 9%