Building a Digital Twin of the Photolithography Area of A Real-World Wafer FAB To Validate Improved Production Control

Patrick C. Deenen, Rick A.M. Adriaensen, John W. Fowler

Research output: Chapter in Book/Report/Conference proceedingConference contribution


Since the photolithography area is generally the bottleneck of a wafer fab, effective scheduling in this area can increase the performance of the complete fab significantly. However, the potential benefit of proposed solution methods is often validated in a static and deterministic scheduling setting, while the manufacturing environment is dynamic and stochastic. In this paper, we build a discrete-event simulation model based on real-world data of the photolithography area, which can be used to accurately determine the performance of new scheduling solutions. A case study at a global semiconductor manufacturer is presented. The simulation model, a so-called digital twin, captures the vast majority of the stochastic behavior such as the arrival of jobs, processing times, setup times and machine downs. In addition, a dispatching heuristic is developed to replicate the current practice of production control. Both the simulation model and the dispatching heuristic are validated and shown to be accurate.

Original languageEnglish (US)
Title of host publicationProceedings of the 2022 Winter Simulation Conference, WSC 2022
EditorsB. Feng, G. Pedrielli, Y. Peng, S. Shashaani, E. Song, C.G. Corlu, L.H. Lee, E.P. Chew, T. Roeder, P. Lendermann
PublisherInstitute of Electrical and Electronics Engineers Inc.
Number of pages12
ISBN (Electronic)9798350309713
StatePublished - 2022
Externally publishedYes
Event2022 Winter Simulation Conference, WSC 2022 - Guilin, China
Duration: Dec 11 2022Dec 14 2022

Publication series

NameProceedings - Winter Simulation Conference
ISSN (Print)0891-7736


Conference2022 Winter Simulation Conference, WSC 2022

ASJC Scopus subject areas

  • Software
  • Modeling and Simulation
  • Computer Science Applications


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