Bi- and trilayer graphene solutions

Chih Jen Shih, Aravind Vijayaraghavan, Rajasekar Krishnan, Richa Sharma, Jae Hee Han, Moon Ho Ham, Zhong Jin, Shangchao Lin, Geraldine L C Paulus, Nigel Forest Reuel, Qing Wang, Daniel Blankschtein, Michael S. Strano

Research output: Contribution to journalArticle

251 Citations (Scopus)

Abstract

Bilayer and trilayer graphene with controlled stacking is emerging as one of the most promising candidates for post-silicon nanoelectronics. However, it is not yet possible to produce large quantities of bilayer or trilayer graphene with controlled stacking, as is required for many applications. Here, we demonstrate a solution-phase technique for the production of large-area, bilayer or trilayer graphene from graphite, with controlled stacking. The ionic compounds iodine chloride (ICl) or iodine bromide (IBr) intercalate the graphite starting material at every second or third layer, creating second- or third-stage controlled graphite intercolation compounds, respectively. The resulting solution dispersions are specifically enriched with bilayer or trilayer graphene, respectively. Because the process requires only mild sonication, it produces graphene flakes with areas as large as 50μm 2. Moreover, the electronic properties of the flakes are superior to those achieved with other solution-based methods; for example, unannealed samples have resistivities as low as ∼1 kω and hole mobilities as high as ∼400 cm2 V-1 s-1. The solution-based process is expected to allow high-throughput production, functionalization, and the transfer of samples to arbitrary substrates.

Original languageEnglish (US)
Pages (from-to)439-445
Number of pages7
JournalNature Nanotechnology
Volume6
Issue number7
DOIs
StatePublished - Jul 2011
Externally publishedYes

Fingerprint

Graphite
Graphene
graphene
graphite
flakes
Iodine compounds
iodine compounds
Hole mobility
Nanoelectronics
Sonication
hole mobility
Iodine
Dispersions
Electronic properties
iodine
bromides
emerging
chlorides
Throughput
Silicon

ASJC Scopus subject areas

  • Bioengineering
  • Biomedical Engineering
  • Materials Science(all)
  • Electrical and Electronic Engineering
  • Condensed Matter Physics
  • Atomic and Molecular Physics, and Optics

Cite this

Shih, C. J., Vijayaraghavan, A., Krishnan, R., Sharma, R., Han, J. H., Ham, M. H., ... Strano, M. S. (2011). Bi- and trilayer graphene solutions. Nature Nanotechnology, 6(7), 439-445. https://doi.org/10.1038/nnano.2011.94

Bi- and trilayer graphene solutions. / Shih, Chih Jen; Vijayaraghavan, Aravind; Krishnan, Rajasekar; Sharma, Richa; Han, Jae Hee; Ham, Moon Ho; Jin, Zhong; Lin, Shangchao; Paulus, Geraldine L C; Reuel, Nigel Forest; Wang, Qing; Blankschtein, Daniel; Strano, Michael S.

In: Nature Nanotechnology, Vol. 6, No. 7, 07.2011, p. 439-445.

Research output: Contribution to journalArticle

Shih, CJ, Vijayaraghavan, A, Krishnan, R, Sharma, R, Han, JH, Ham, MH, Jin, Z, Lin, S, Paulus, GLC, Reuel, NF, Wang, Q, Blankschtein, D & Strano, MS 2011, 'Bi- and trilayer graphene solutions', Nature Nanotechnology, vol. 6, no. 7, pp. 439-445. https://doi.org/10.1038/nnano.2011.94
Shih CJ, Vijayaraghavan A, Krishnan R, Sharma R, Han JH, Ham MH et al. Bi- and trilayer graphene solutions. Nature Nanotechnology. 2011 Jul;6(7):439-445. https://doi.org/10.1038/nnano.2011.94
Shih, Chih Jen ; Vijayaraghavan, Aravind ; Krishnan, Rajasekar ; Sharma, Richa ; Han, Jae Hee ; Ham, Moon Ho ; Jin, Zhong ; Lin, Shangchao ; Paulus, Geraldine L C ; Reuel, Nigel Forest ; Wang, Qing ; Blankschtein, Daniel ; Strano, Michael S. / Bi- and trilayer graphene solutions. In: Nature Nanotechnology. 2011 ; Vol. 6, No. 7. pp. 439-445.
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