Beam-induced damage to thin specimens in an intense electron probe

Raymond F. Egerton, Feng Wang, Peter Crozier

Research output: Contribution to journalArticlepeer-review

86 Scopus citations

Abstract

We have investigated the changes produced in single-element and two-layer transmission electron microscope (TEM) specimens irradiated by an intense nanometer-sized electron probe, such as that produced in a field-emission or aberration-corrected TEM. These changes include hole formation and the accumulation of material within the irradiated area. The results are discussed in terms of mechanisms, including electron-beam sputtering and surface diffusion. Strategies for minimizing the effect of the beam are considered.

Original languageEnglish (US)
Pages (from-to)65-71
Number of pages7
JournalMicroscopy and Microanalysis
Volume12
Issue number1
DOIs
StatePublished - Feb 2006

Keywords

  • Aberration-corrected probe
  • Electron sputtering
  • Radiation damage

ASJC Scopus subject areas

  • Instrumentation

Fingerprint Dive into the research topics of 'Beam-induced damage to thin specimens in an intense electron probe'. Together they form a unique fingerprint.

Cite this