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Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability
Michael J. Mutch, Thomas Pomorski, Brad C. Bittel, Corey J. Cochrane, Patrick M. Lenahan, Xin Liu, Robert Nemanich, Justin Brockman, Marc French, Markus Kuhn, Benjamin French, Sean W. King
Research output: Contribution to journal › Article › peer-review
18
Scopus
citations