Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability

Michael J. Mutch, Thomas Pomorski, Brad C. Bittel, Corey J. Cochrane, Patrick M. Lenahan, Xin Liu, Robert Nemanich, Justin Brockman, Marc French, Markus Kuhn, Benjamin French, Sean W. King

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

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