Band alignment at AlN/Si (111) and (001) interfaces

Sean W. King, Robert Nemanich, Robert F. Davis

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Abstract

To advance the development of III-V nitride on silicon heterostructure semiconductor devices, we have utilized in-situ x-ray photoelectron spectroscopy (XPS) to investigate the chemistry and valence band offset (VBO) at interfaces formed by gas source molecular beam epitaxy of AlN on Si (001) and (111) substrates. For the range of growth temperatures (600-1050-°C) and Al pre-exposures (1-15-min) explored, XPS showed the formation of Si-N bonding at the AlN/Si interface in all cases. The AlN/Si VBO was determined to be -3.5-±-0.3-eV and independent of the Si orientation and degree of interfacial Si-N bond formation. The corresponding AlN/Si conduction band offset (CBO) was calculated to be 1.6-±-0.3-eV based on the measured VBO and band gap for wurtzite AlN. Utilizing these results, prior reports for the GaN/AlN band alignment, and transitive and commutative rules for VBOs, the VBO and CBO at the GaN/Si interface were determined to be -2.7-±-0.3 and -0.4-±-0.3-eV, respectively.

Original languageEnglish (US)
Article number045304
JournalJournal of Applied Physics
Volume118
Issue number4
DOIs
StatePublished - Jul 28 2015

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ASJC Scopus subject areas

  • Physics and Astronomy(all)

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