Ballistic transport-reaction prediction of film conformality in tetraethoxysilane 02 plasma enhanced deposition of silicon dioxide

Engineering & Materials Science

• Ballistics 90%
• Silica 84%
• Plasmas 75%
• Oxygen 66%
• Polymers 59%
• Atoms 48%
• Film growth 37%
• Ions 32%
• Deposition rates 29%
• Plasma sheaths 20%
• Fluxes 18%
• Surface reactions 16%
• Plasma enhanced chemical vapor deposition 16%
• Surface chemistry 15%
• Distribution functions 12%
• Constitutive models 11%
• Aspect ratio 10%
• Oxidation 10%
• Temperature 9%
• Simulators 8%

Physics & Astronomy

• ballistics 80%
• silicon dioxide 62%
• predictions 43%
• oxygen ions 33%
• oxygen atoms 31%
• profiles 22%
• trends 15%
• plasma sheaths 13%
• attack 11%
• surface reactions 10%
• simulators 10%
• standard deviation 9%
• aspect ratio 9%
• chemistry 8%
• fragments 8%
• low pressure 8%
• distribution functions 8%
• vapor deposition 7%
• oxidation 7%
• oxygen 6%
• kinetics 6%
• temperature 6%
• atoms 5%
• simulation 3%

Chemical Compounds

• Silicon Dioxide 100%
• Plasma 50%
• Liquid Film 39%
• Oxygen Atom 24%
• Dioxygen 19%
• Distribution Function 12%
• Plasma Enhanced Chemical Vapour Deposition 12%
• Ion 12%
• Pressure 11%
• Deposition Process 11%
• Surface Reaction 10%
• Surface 9%
• Surface Chemistry 9%
• Simulation 6%
• Oxidation Reaction 4%
• Mixture 4%