Automating and sequencing C-V measurements for process fault diagnosis using a pattern-recognition approach

J. A. Walls; A. J. Walton; J. M. Robertson; T. M. Crawford

Automating and sequencing C-V measurements for process fault diagnosis using a pattern-recognition approach

J. A. Walls, A. J. Walton, J. M. Robertson, T. M. Crawford

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The authors demonstrate how a pattern-recognition system can be applied to the interpretation of C-V curves on an MOS test structure. The system is capable of automatically sequencing the appropriate measurements required to extract accurately the maximum amount of information available from C-V and G-V measurements. Unlike many other expert systems, CV-ASSIST is an integral part of the measurement, instrumentation, and control software and is thus able to call up a sequence of individually tailored tests for the MOS test structure under investigation.

Original language	English (US)
Title of host publication	Proc 1989 Int Conf Microelectron Test Struct
Editors	Anon
Publisher	Publ by IEEE
Pages	193-199
Number of pages	7
ISBN (Print)	0879427140
State	Published - 1989
Externally published	Yes
Event	Proceedings of the 1989 International Conference on Microelectronic Test Structures - Edinburgh, Scotl Duration: Mar 13 1989 → Mar 14 1989

Publication series

Name	Proc 1989 Int Conf Microelectron Test Struct

Other

Other	Proceedings of the 1989 International Conference on Microelectronic Test Structures
City	Edinburgh, Scotl
Period	3/13/89 → 3/14/89

ASJC Scopus subject areas

General Engineering

Cite this

Automating and sequencing C-V measurements for process fault diagnosis using a pattern-recognition approach. / Walls, J. A.; Walton, A. J.; Robertson, J. M. et al.
Proc 1989 Int Conf Microelectron Test Struct. ed. / Anon. Publ by IEEE, 1989. p. 193-199 (Proc 1989 Int Conf Microelectron Test Struct).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Walls, JA, Walton, AJ, Robertson, JM & Crawford, TM 1989, Automating and sequencing C-V measurements for process fault diagnosis using a pattern-recognition approach. in Anon (ed.), Proc 1989 Int Conf Microelectron Test Struct. Proc 1989 Int Conf Microelectron Test Struct, Publ by IEEE, pp. 193-199, Proceedings of the 1989 International Conference on Microelectronic Test Structures, Edinburgh, Scotl, 3/13/89.

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abstract = "The authors demonstrate how a pattern-recognition system can be applied to the interpretation of C-V curves on an MOS test structure. The system is capable of automatically sequencing the appropriate measurements required to extract accurately the maximum amount of information available from C-V and G-V measurements. Unlike many other expert systems, CV-ASSIST is an integral part of the measurement, instrumentation, and control software and is thus able to call up a sequence of individually tailored tests for the MOS test structure under investigation.",

author = "Walls, {J. A.} and Walton, {A. J.} and Robertson, {J. M.} and Crawford, {T. M.}",

year = "1989",

language = "English (US)",

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series = "Proc 1989 Int Conf Microelectron Test Struct",

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AU - Walton, A. J.

AU - Robertson, J. M.

AU - Crawford, T. M.

PY - 1989

Y1 - 1989

N2 - The authors demonstrate how a pattern-recognition system can be applied to the interpretation of C-V curves on an MOS test structure. The system is capable of automatically sequencing the appropriate measurements required to extract accurately the maximum amount of information available from C-V and G-V measurements. Unlike many other expert systems, CV-ASSIST is an integral part of the measurement, instrumentation, and control software and is thus able to call up a sequence of individually tailored tests for the MOS test structure under investigation.

AB - The authors demonstrate how a pattern-recognition system can be applied to the interpretation of C-V curves on an MOS test structure. The system is capable of automatically sequencing the appropriate measurements required to extract accurately the maximum amount of information available from C-V and G-V measurements. Unlike many other expert systems, CV-ASSIST is an integral part of the measurement, instrumentation, and control software and is thus able to call up a sequence of individually tailored tests for the MOS test structure under investigation.

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M3 - Conference contribution

AN - SCOPUS:0024941559

SN - 0879427140

T3 - Proc 1989 Int Conf Microelectron Test Struct

SP - 193

EP - 199

BT - Proc 1989 Int Conf Microelectron Test Struct

A2 - Anon, null

PB - Publ by IEEE

T2 - Proceedings of the 1989 International Conference on Microelectronic Test Structures

Y2 - 13 March 1989 through 14 March 1989

ER -

Automating and sequencing C-V measurements for process fault diagnosis using a pattern-recognition approach

Abstract

Publication series

Other

ASJC Scopus subject areas

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