Automating and sequencing C-V measurements for process fault diagnosis using a pattern-recognition approach

J. A. Walls, A. J. Walton, J. M. Robertson, T. M. Crawford

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Scopus citations

Abstract

The authors demonstrate how a pattern-recognition system can be applied to the interpretation of C-V curves on an MOS test structure. The system is capable of automatically sequencing the appropriate measurements required to extract accurately the maximum amount of information available from C-V and G-V measurements. Unlike many other expert systems, CV-ASSIST is an integral part of the measurement, instrumentation, and control software and is thus able to call up a sequence of individually tailored tests for the MOS test structure under investigation.

Original languageEnglish (US)
Title of host publicationProc 1989 Int Conf Microelectron Test Struct
Editors Anon
PublisherPubl by IEEE
Pages193-199
Number of pages7
ISBN (Print)0879427140
StatePublished - Dec 1 1989
EventProceedings of the 1989 International Conference on Microelectronic Test Structures - Edinburgh, Scotl
Duration: Mar 13 1989Mar 14 1989

Publication series

NameProc 1989 Int Conf Microelectron Test Struct

Other

OtherProceedings of the 1989 International Conference on Microelectronic Test Structures
CityEdinburgh, Scotl
Period3/13/893/14/89

ASJC Scopus subject areas

  • Engineering(all)

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