Auger electron spectroscopy and microscopy with probe-size limited resolution

G. G. Hembree; Jeffery Drucker; F. C H Luo; M. Krishnamurthy; J. A. Venables

doi:10.1063/1.105064

Auger electron spectroscopy and microscopy with probe-size limited resolution

G. G. Hembree, Jeffery Drucker, F. C H Luo, M. Krishnamurthy, J. A. Venables

Research output: Contribution to journal › Article › peer-review

22 Scopus citations

Abstract

High spatial resolution Auger electron spectra and images have been obtained by optimizing secondary electron collection efficiency in a scanning transmission electron microscope (STEM). We describe an ultrahigh vacuum, 100 keV STEM which is capable of collecting Auger electron spectra and images with edge resolutions of ≤5 nm. Typical spectra and images from the Ge/Si(100) and Ag/Si(100) film growth systems are presented and discussed. These images demonstrate high-resolution elemental mapping which can be used in the study of surface processes on the nanometer scale.

Original language	English (US)
Pages (from-to)	1890-1892
Number of pages	3
Journal	Applied Physics Letters
Volume	58
Issue number	17
DOIs	https://doi.org/10.1063/1.105064
State	Published - Dec 1 1991

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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@article{51a86a4759014af78cd17610aeeaa7c6,

title = "Auger electron spectroscopy and microscopy with probe-size limited resolution",

abstract = "High spatial resolution Auger electron spectra and images have been obtained by optimizing secondary electron collection efficiency in a scanning transmission electron microscope (STEM). We describe an ultrahigh vacuum, 100 keV STEM which is capable of collecting Auger electron spectra and images with edge resolutions of ≤5 nm. Typical spectra and images from the Ge/Si(100) and Ag/Si(100) film growth systems are presented and discussed. These images demonstrate high-resolution elemental mapping which can be used in the study of surface processes on the nanometer scale.",

author = "Hembree, {G. G.} and Jeffery Drucker and Luo, {F. C H} and M. Krishnamurthy and Venables, {J. A.}",

year = "1991",

month = dec,

day = "1",

doi = "10.1063/1.105064",

language = "English (US)",

volume = "58",

pages = "1890--1892",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "17",

}

TY - JOUR

T1 - Auger electron spectroscopy and microscopy with probe-size limited resolution

AU - Hembree, G. G.

AU - Drucker, Jeffery

AU - Luo, F. C H

AU - Krishnamurthy, M.

AU - Venables, J. A.

PY - 1991/12/1

Y1 - 1991/12/1

N2 - High spatial resolution Auger electron spectra and images have been obtained by optimizing secondary electron collection efficiency in a scanning transmission electron microscope (STEM). We describe an ultrahigh vacuum, 100 keV STEM which is capable of collecting Auger electron spectra and images with edge resolutions of ≤5 nm. Typical spectra and images from the Ge/Si(100) and Ag/Si(100) film growth systems are presented and discussed. These images demonstrate high-resolution elemental mapping which can be used in the study of surface processes on the nanometer scale.

AB - High spatial resolution Auger electron spectra and images have been obtained by optimizing secondary electron collection efficiency in a scanning transmission electron microscope (STEM). We describe an ultrahigh vacuum, 100 keV STEM which is capable of collecting Auger electron spectra and images with edge resolutions of ≤5 nm. Typical spectra and images from the Ge/Si(100) and Ag/Si(100) film growth systems are presented and discussed. These images demonstrate high-resolution elemental mapping which can be used in the study of surface processes on the nanometer scale.

UR - http://www.scopus.com/inward/record.url?scp=0000848203&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0000848203&partnerID=8YFLogxK

U2 - 10.1063/1.105064

DO - 10.1063/1.105064

M3 - Article

AN - SCOPUS:0000848203

VL - 58

SP - 1890

EP - 1892

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 17

ER -