Attractive migration and coalescence: A significant process in the coarsening of TiSi2 islands on the Si(111) surface

W. C. Yang; M. Zeman; H. Ade; R. J. Nemanich

Attractive migration and coalescence: A significant process in the coarsening of TiSi₂ islands on the Si(111) surface

W. C. Yang, M. Zeman, H. Ade, R. J. Nemanich

Research output: Contribution to journal › Article › peer-review

Abstract

Real time PEEM was used to observe the surface dynamics of TiSi₂ islands on Si at high temperature. By monitoring the relative position of individual islands, it was found that the islands grew through both Ostwald ripening and attractive migration and coalescence. It was proposed that the attractive migration of the islands is the growth-decay flow of the island edges due to the nonuniform concentration around the islands.

Original language	English (US)
Article number	136102
Pages (from-to)	136102/1-136102/4
Journal	Physical Review Letters
Volume	90
Issue number	13
State	Published - Apr 4 2003
Externally published	Yes

ASJC Scopus subject areas

General Physics and Astronomy

Cite this

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title = "Attractive migration and coalescence: A significant process in the coarsening of TiSi2 islands on the Si(111) surface",

abstract = "Real time PEEM was used to observe the surface dynamics of TiSi2 islands on Si at high temperature. By monitoring the relative position of individual islands, it was found that the islands grew through both Ostwald ripening and attractive migration and coalescence. It was proposed that the attractive migration of the islands is the growth-decay flow of the island edges due to the nonuniform concentration around the islands.",

author = "Yang, {W. C.} and M. Zeman and H. Ade and Nemanich, {R. J.}",

note = "Funding Information: We gratefully acknowledge helpful discussions with Professor C. Roland. We also acknowledge the Duke Free Electron Laser Laboratory for access to the OK-4 UV free electron laser. This work was supported in part by the NSF under Grant No. DMR 0102652 and the DoD MFEL program as administered by the AFOSR through Contract No. F49620-00-1-0370.",

year = "2003",

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day = "4",

language = "English (US)",

volume = "90",

pages = "136102/1--136102/4",

journal = "Physical Review Letters",

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T1 - Attractive migration and coalescence

T2 - A significant process in the coarsening of TiSi2 islands on the Si(111) surface

AU - Yang, W. C.

AU - Zeman, M.

AU - Ade, H.

AU - Nemanich, R. J.

N1 - Funding Information: We gratefully acknowledge helpful discussions with Professor C. Roland. We also acknowledge the Duke Free Electron Laser Laboratory for access to the OK-4 UV free electron laser. This work was supported in part by the NSF under Grant No. DMR 0102652 and the DoD MFEL program as administered by the AFOSR through Contract No. F49620-00-1-0370.

PY - 2003/4/4

Y1 - 2003/4/4

N2 - Real time PEEM was used to observe the surface dynamics of TiSi2 islands on Si at high temperature. By monitoring the relative position of individual islands, it was found that the islands grew through both Ostwald ripening and attractive migration and coalescence. It was proposed that the attractive migration of the islands is the growth-decay flow of the island edges due to the nonuniform concentration around the islands.

AB - Real time PEEM was used to observe the surface dynamics of TiSi2 islands on Si at high temperature. By monitoring the relative position of individual islands, it was found that the islands grew through both Ostwald ripening and attractive migration and coalescence. It was proposed that the attractive migration of the islands is the growth-decay flow of the island edges due to the nonuniform concentration around the islands.

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JO - Physical Review Letters

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IS - 13

M1 - 136102

ER -

Attractive migration and coalescence: A significant process in the coarsening of TiSi₂ islands on the Si(111) surface

Abstract

ASJC Scopus subject areas

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