A study on atomic layer chemical vapor deposition of ZrO2-based dielectric films was presented. It was found that the deposited layer was amorphous ZrO2-rich Zr silicate containing about 15% by volume of embedded ZrO2 nanocrystals, which were transformed into glass nanoceramics. It was also found that the measured equivalent oxide thickness (EOT) was not consistent with the calculated EOT using a bilayer model of ZrO2 and SiO2. The experimental results showed that a multiphase and heterogeneous structure were evolved which was called Zr-O/IL/Si stack.
ASJC Scopus subject areas
- Physics and Astronomy(all)