Abstract
Electron microscopes with atomic resolution have recently been used to study surfaces and to observe surface processes in real-time. The role of image simulations in confirming the interpretation of surface profile images is discussed and recent applications of the profile imaging technique to study semiconductors, oxides, the oxidation of metals, and small metal particles are briefly reviewed. Finally, the accumulation of metal deposits on some oxide and semiconductor surfaces due to electron-stimulated desorption processes is described.
Original language | English (US) |
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Pages (from-to) | 462-474 |
Number of pages | 13 |
Journal | Surface Science |
Volume | 178 |
Issue number | 1-3 |
DOIs | |
State | Published - Dec 3 1986 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry