TY - JOUR
T1 - Atomic imaging of surfaces by electron microscopy
AU - Smith, David
N1 - Funding Information:
Arizona State University, supported by NSF Grant DMR-8306501. Partial support from the Arizona State University Research Fund is also acknowledged. I am grateful to several friends and colleagues for their continuing collaboration on different aspects of our work which has been mentioned here.
PY - 1986/12/3
Y1 - 1986/12/3
N2 - Electron microscopes with atomic resolution have recently been used to study surfaces and to observe surface processes in real-time. The role of image simulations in confirming the interpretation of surface profile images is discussed and recent applications of the profile imaging technique to study semiconductors, oxides, the oxidation of metals, and small metal particles are briefly reviewed. Finally, the accumulation of metal deposits on some oxide and semiconductor surfaces due to electron-stimulated desorption processes is described.
AB - Electron microscopes with atomic resolution have recently been used to study surfaces and to observe surface processes in real-time. The role of image simulations in confirming the interpretation of surface profile images is discussed and recent applications of the profile imaging technique to study semiconductors, oxides, the oxidation of metals, and small metal particles are briefly reviewed. Finally, the accumulation of metal deposits on some oxide and semiconductor surfaces due to electron-stimulated desorption processes is described.
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U2 - 10.1016/0039-6028(86)90323-7
DO - 10.1016/0039-6028(86)90323-7
M3 - Article
AN - SCOPUS:46149131469
VL - 178
SP - 462
EP - 474
JO - Surface Science
JF - Surface Science
SN - 0039-6028
IS - 1-3
ER -