Abstract
We describe a method to fabricate atomic-scale gaps and contacts between two metal electrodes. The method uses a directional electrodeposition process and has a built-in self-termination mechanism. The final gap width and contact size are preset by an external resistor (Rext) that is connected in series to one of the electrodes. If 1/Rext is chosen to be much smaller than the conductance quantum (G0=2e2/h), a small gap with conductance determined by electron tunneling is formed. If 1/R ext is comparable or greater than G0, a contact with conductance near a multiple of G0 is fabricated.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2398-2400 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 80 |
| Issue number | 13 |
| DOIs | |
| State | Published - Apr 1 2002 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
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Boussaad, S., & Tao, N. (2002). Atom-size gaps and contacts between electrodes fabricated with a self-terminated electrochemical method. Applied Physics Letters, 80(13), 2398-2400. https://doi.org/10.1063/1.1465128