Abstract
We describe a method to fabricate atomic-scale gaps and contacts between two metal electrodes. The method uses a directional electrodeposition process and has a built-in self-termination mechanism. The final gap width and contact size are preset by an external resistor (Rext) that is connected in series to one of the electrodes. If 1/Rext is chosen to be much smaller than the conductance quantum (G0=2e2/h), a small gap with conductance determined by electron tunneling is formed. If 1/R ext is comparable or greater than G0, a contact with conductance near a multiple of G0 is fabricated.
Original language | English (US) |
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Pages (from-to) | 2398-2400 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 80 |
Issue number | 13 |
DOIs | |
State | Published - Apr 1 2002 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)