Atom-size gaps and contacts between electrodes fabricated with a self-terminated electrochemical method

S. Boussaad, Nongjian Tao

Research output: Contribution to journalArticle

83 Citations (Scopus)

Abstract

We describe a method to fabricate atomic-scale gaps and contacts between two metal electrodes. The method uses a directional electrodeposition process and has a built-in self-termination mechanism. The final gap width and contact size are preset by an external resistor (Rext) that is connected in series to one of the electrodes. If 1/Rext is chosen to be much smaller than the conductance quantum (G0=2e2/h), a small gap with conductance determined by electron tunneling is formed. If 1/R ext is comparable or greater than G0, a contact with conductance near a multiple of G0 is fabricated.

Original languageEnglish (US)
Pages (from-to)2398-2400
Number of pages3
JournalApplied Physics Letters
Volume80
Issue number13
DOIs
StatePublished - Apr 1 2002

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electrodes
atoms
electron tunneling
resistors
electrodeposition
metals

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Atom-size gaps and contacts between electrodes fabricated with a self-terminated electrochemical method. / Boussaad, S.; Tao, Nongjian.

In: Applied Physics Letters, Vol. 80, No. 13, 01.04.2002, p. 2398-2400.

Research output: Contribution to journalArticle

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