ATOM-PROBE FIELD-ION MICROSCOPY OF A HIGH INTENSITY GALLIUM ION SOURCE.

Robert Culbertson, G. H. Robertson, Y. Kuk, T. Sakurai

Research output: Contribution to journalArticle

33 Citations (Scopus)

Abstract

The emission characteristics of a liquid-metal ion source have been studied with a magnetic-sector atom-probe field-ion microscope. The emission is classified into low, intermediate, and high intensity emission regimes. In the high intensity emission regime the emission is approximately 99% Ga** plus , but Ga** plus ** plus and molecular gallium ions are also present. The relative intensities of Ga** plus , Ga** plus ** plus , Ga//2** plus , and Ga//3** plus were measured as a function of total current in the high intensity emission regime. Energy distributions of these four species were also measured at various total currents.

Original languageEnglish (US)
Pages (from-to)203-206
Number of pages4
JournalJournal of vacuum science & technology
Volume17
Issue number1
DOIs
StatePublished - Jan 1979
Externally publishedYes

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Ion microscopes
Ion sources
Gallium
Liquid metals
Metal ions
Microscopic examination
Atoms
Ions

ASJC Scopus subject areas

  • Engineering(all)

Cite this

ATOM-PROBE FIELD-ION MICROSCOPY OF A HIGH INTENSITY GALLIUM ION SOURCE. / Culbertson, Robert; Robertson, G. H.; Kuk, Y.; Sakurai, T.

In: Journal of vacuum science & technology, Vol. 17, No. 1, 01.1979, p. 203-206.

Research output: Contribution to journalArticle

Culbertson, Robert ; Robertson, G. H. ; Kuk, Y. ; Sakurai, T. / ATOM-PROBE FIELD-ION MICROSCOPY OF A HIGH INTENSITY GALLIUM ION SOURCE. In: Journal of vacuum science & technology. 1979 ; Vol. 17, No. 1. pp. 203-206.
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