ASAP7 predictive design kit development and cell design technology co-optimization

Invited paper

Vinay Vashishtha, Manoj Vangala, Lawrence T. Clark

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

This work discusses the ASAP7 predictive process design kit (PDK) and associated standard cell library. The necessity for multi-patterning (MP) techniques at advanced nodes results in the standard cell and SRAM architecture becoming entangled with design rules, mandating design-technology co-optimization (DTCO). This paper discusses the DTCO process involving standard cell physical design. An assumption of extreme ultraviolet (EUV) lithography availability in the PDK allows bi-directional M1 geometries that are difficult with MP. Routing and power distribution schemes for self-aligned quadruple patterning (SAQP) friendly, high density standard cell based blocks are shown. Restrictive design rules are required and supported by the automated place and route (APR) setup. Supporting sub-20 nm dimensions with academic tool licenses is described. The APR (QRC techfile) extraction shows high correlation with the Calibre extraction deck. Finally, use of the PDK for academic coursework and research is discussed.

Original languageEnglish (US)
Title of host publication2017 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages992-998
Number of pages7
Volume2017-November
ISBN (Electronic)9781538630938
DOIs
StatePublished - Dec 13 2017
Event36th IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2017 - Irvine, United States
Duration: Nov 13 2017Nov 16 2017

Other

Other36th IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2017
CountryUnited States
CityIrvine
Period11/13/1711/16/17

Fingerprint

Process design
Extreme ultraviolet lithography
Static random access storage
Availability
Geometry

Keywords

  • Automatic place and route
  • Design Rules
  • EUV
  • FinFET
  • Parasitic Extraction
  • Physical Design
  • Standard Cell Library
  • Timing Characterization

ASJC Scopus subject areas

  • Software
  • Computer Science Applications
  • Computer Graphics and Computer-Aided Design

Cite this

Vashishtha, V., Vangala, M., & Clark, L. T. (2017). ASAP7 predictive design kit development and cell design technology co-optimization: Invited paper. In 2017 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2017 (Vol. 2017-November, pp. 992-998). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ICCAD.2017.8203889

ASAP7 predictive design kit development and cell design technology co-optimization : Invited paper. / Vashishtha, Vinay; Vangala, Manoj; Clark, Lawrence T.

2017 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2017. Vol. 2017-November Institute of Electrical and Electronics Engineers Inc., 2017. p. 992-998.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Vashishtha, V, Vangala, M & Clark, LT 2017, ASAP7 predictive design kit development and cell design technology co-optimization: Invited paper. in 2017 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2017. vol. 2017-November, Institute of Electrical and Electronics Engineers Inc., pp. 992-998, 36th IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2017, Irvine, United States, 11/13/17. https://doi.org/10.1109/ICCAD.2017.8203889
Vashishtha V, Vangala M, Clark LT. ASAP7 predictive design kit development and cell design technology co-optimization: Invited paper. In 2017 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2017. Vol. 2017-November. Institute of Electrical and Electronics Engineers Inc. 2017. p. 992-998 https://doi.org/10.1109/ICCAD.2017.8203889
Vashishtha, Vinay ; Vangala, Manoj ; Clark, Lawrence T. / ASAP7 predictive design kit development and cell design technology co-optimization : Invited paper. 2017 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2017. Vol. 2017-November Institute of Electrical and Electronics Engineers Inc., 2017. pp. 992-998
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