Approaching the resolution limit of nanometer-scale electron beam-induced deposition

Willem F. Van Dorp, Bob Van Someren, Cornells W. Hagen, Pieter Kruit, Peter Crozier

Research output: Contribution to journalArticle

220 Scopus citations

Abstract

We report the writing of very high resolution tungsten containing dots in regular arrays by electron beam-induced deposition (EBID). The size averaged over 100 dots was 1.0 nm at fwhm. Because of the statistical spread in the dot size, large and small dots are present in the arrays, with the smallest having a diameter of only 0.7 nm at fwhm. To date these are the smallest features fabricated by EBID. We have also fabricated lines with the smallest having a width at fwhm of 1.9 nm and a spacing of 3.2 nm.

Original languageEnglish (US)
Pages (from-to)1303-1307
Number of pages5
JournalNano Letters
Volume5
Issue number7
DOIs
StatePublished - Jul 1 2005

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ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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