Application of the MOS charge-sheet model to nonuniform doping along the channel

James Victory, Julian Sanchez, Thomas DeMassa, Bruno Welfert

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Nonuniform doping along the channel direction has played a central role in the power MOS device field. In addition, a new class of submicron devices using nonuniformly doped channels have exhibited remarkable resistance to short channel effects. Modeling of these devices for CAD applications has been limited to empirical models which assume uniform doping. The substrate doping concentration directly affects the electrostatics in the channel region and any variation in its value has significant effects on the device parameters. This paper presents a generalized version of the MOS charge-sheet model which physically incorporates nonuniform doping along the channel into the analysis. The model is developed and verified using the two dimensional device simulator PISCES on nonuniformly doped MOSFETs.

Original languageEnglish (US)
Pages (from-to)1497-1503
Number of pages7
JournalSolid State Electronics
Volume38
Issue number8
DOIs
StatePublished - 1995

Fingerprint

Doping (additives)
MOS devices
Electrostatics
Computer aided design
computer aided design
Simulators
simulators
field effect transistors
electrostatics
Substrates

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Condensed Matter Physics

Cite this

Application of the MOS charge-sheet model to nonuniform doping along the channel. / Victory, James; Sanchez, Julian; DeMassa, Thomas; Welfert, Bruno.

In: Solid State Electronics, Vol. 38, No. 8, 1995, p. 1497-1503.

Research output: Contribution to journalArticle

Victory, James ; Sanchez, Julian ; DeMassa, Thomas ; Welfert, Bruno. / Application of the MOS charge-sheet model to nonuniform doping along the channel. In: Solid State Electronics. 1995 ; Vol. 38, No. 8. pp. 1497-1503.
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