Annealing of intimate Au-GaAs Schottky barriers: Thick and ultrathin metal films

N. Newman, W. G. Petro, T. Kendelewicz, S. H. Pan, S. J. Eglash, W. E. Spicer

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Abstract

Using valence-band and core-level photoemission spectroscopy (PES) and electrical device measurements, the effects of annealing on Au:n-type (110) GaAs Schottky diodes fabricated in ultrahigh vacuum have been studied. Similiar trends in the annealing-induced changes in the barrier height of Au:n-type GaAs were found for 0.2 and 15 monolayer coverages as determined by PES and for thick film coverages (1000 Å) as determined by current-voltage (I-V) and capacitance-voltage (C-V) measurement techniques. In each case, the barrier height was found to be stable for temperatures between 30 and 200 °C and between 300 and 500 °C; while a gradual decrease in the barrier height was found for annealing temperatures of 200-300 °C. These changes are correlated with the formation of a Au-Ga rich layer at the interface during anneals at 200 to 300 °C. Leakage currents were found to dominate the I-V characteristics in the devices which were annealed above the Au-Ga eutectic temperature. These peripheral leakage currents were eliminated by mesa-etching the devices. This allowed more reliable barrier height determinations using device measurements for higher annealing temperatures than has been previously reported for the Au-GaAs system.

Original languageEnglish (US)
Pages (from-to)1247-1251
Number of pages5
JournalJournal of Applied Physics
Volume57
Issue number4
DOIs
StatePublished - Dec 1 1985
Externally publishedYes

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ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Newman, N., Petro, W. G., Kendelewicz, T., Pan, S. H., Eglash, S. J., & Spicer, W. E. (1985). Annealing of intimate Au-GaAs Schottky barriers: Thick and ultrathin metal films. Journal of Applied Physics, 57(4), 1247-1251. https://doi.org/10.1063/1.334521