Analysis of thin-film systems using nonresonant multiphoton ionization

J. B. Pallix, C. H. Becker, Nathan Newman

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

Surface analysis by laser ionization (SALI) has been used to probe thin-film chemical compositions. Ar +sputtering at 5–7 keV is used for ion beam milling together with nonresonant photoionization of sputtered neutrals. Photoions are analyzed by reflection time-of-flight mass spectrometry. SALI depth profiles of UHV deposited Au on GaAs show diffusion of Ga and As in the Au film and dramatic compositional variation at the interface after annealing at 405 °C for 10 min. Mass spectra taken from different depths within a superconducting thin film of nominal composition YBa2Cu3O7show a variety of impurity compounds even though critical current densities are quite high.

Original languageEnglish (US)
Pages (from-to)1049-1052
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume6
Issue number3
DOIs
StatePublished - 1988
Externally publishedYes

Fingerprint

Surface analysis
Ionization
ionization
Thin films
Photoionization
Superconducting films
Lasers
thin films
Chemical analysis
Ion beams
mass spectra
lasers
Mass spectrometry
Sputtering
photoionization
critical current
chemical composition
mass spectroscopy
sputtering
ion beams

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Analysis of thin-film systems using nonresonant multiphoton ionization. / Pallix, J. B.; Becker, C. H.; Newman, Nathan.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 6, No. 3, 1988, p. 1049-1052.

Research output: Contribution to journalArticle

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