TY - GEN
T1 - Analysis of Inverse Lifetime Curves of TaOx Electron-Selective Contacts for Si Solar Cells
AU - Arulanandam, Madhan K.
AU - Mohan Kumar, Niranjana
AU - Zhang, Chaomin
AU - Iyer, Abhishek
AU - Opila, Robert L.
AU - King, Richard R.
N1 - Publisher Copyright:
© 2019 IEEE.
PY - 2019/6
Y1 - 2019/6
N2 - The analysis of Auger-corrected inverse minoritycarrier lifetime as a function of excess carrier concentration can impart information about many crucial solar cell material properties including: emitter saturation current density (Jo), surface recombination velocity (SRV), Shockley-Read-Hall (SRH) recombination in the bulk, trap density, band bending, surface Fermi-level pinning, and bandgap narrowing. This work demonstrates TaOx as a potential electron selective contact and passivation layer on silicon. Increasing TaOx thickness reduces the measured upper limit of effective surface recombination velocity (Seff, UL). The minimum Seff, UL is 55 cm/s for CZ n-Si/ 30 nm TaOx interfaces. Seff, UL increases for Si / TaOx / ITO structures due to unfavorable band bending.
AB - The analysis of Auger-corrected inverse minoritycarrier lifetime as a function of excess carrier concentration can impart information about many crucial solar cell material properties including: emitter saturation current density (Jo), surface recombination velocity (SRV), Shockley-Read-Hall (SRH) recombination in the bulk, trap density, band bending, surface Fermi-level pinning, and bandgap narrowing. This work demonstrates TaOx as a potential electron selective contact and passivation layer on silicon. Increasing TaOx thickness reduces the measured upper limit of effective surface recombination velocity (Seff, UL). The minimum Seff, UL is 55 cm/s for CZ n-Si/ 30 nm TaOx interfaces. Seff, UL increases for Si / TaOx / ITO structures due to unfavorable band bending.
KW - TaO
KW - electron selective contact
KW - minority charge carrier lifetime
KW - rapid thermal annealing
KW - silicon
KW - surface recombination velocity
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U2 - 10.1109/PVSC40753.2019.8981188
DO - 10.1109/PVSC40753.2019.8981188
M3 - Conference contribution
AN - SCOPUS:85081637816
T3 - Conference Record of the IEEE Photovoltaic Specialists Conference
SP - 983
EP - 988
BT - 2019 IEEE 46th Photovoltaic Specialists Conference, PVSC 2019
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 46th IEEE Photovoltaic Specialists Conference, PVSC 2019
Y2 - 16 June 2019 through 21 June 2019
ER -