Abstract
The GaAs surface was prepared by molecular beam epitaxy (MBE) and covered with an arsenic cap. Its removal was monitored by photoemission spectroscopy utilizing synchrotron radiation. After formation of an aluminum Schottky barrier, the interfacial position of the Fermi level was measured by photoemission spectroscopy and barrier height was measured by I-V and C-V techniques.
Original language | English (US) |
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Pages (from-to) | 481-485 |
Number of pages | 5 |
Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
Volume | 2 |
Issue number | 3 |
DOIs | |
State | Published - 1984 |
Externally published | Yes |
Event | Proc of the Annu Conf on the Phys and Chem of Semicond Interfaces, 11th - Pinehurst, NC, USA Duration: Jan 31 1984 → Feb 2 1984 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering