Advanced control design considerations for the Czochralski process

Michael A. Gevelber, Michael J. Wargo, George Stephanopoulos

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

A new control system design is proposed for the Czochralski process. A set of control objectives is proposed to meet the materials objectives and limitations posed by the coupling of the process (i.e., heater, melt, meniscus, interface, crystal and environment). Attention is given to the requirements for gallium arsenide growth including thermal stress in the growing crystal. Analysis of the process dynamics indicates the disturbances and dynamic features that must be considered in the controller design.

Original languageEnglish (US)
Pages (from-to)256-263
Number of pages8
JournalJournal of Crystal Growth
Volume85
Issue number1-2
DOIs
StatePublished - Nov 1 1987
Externally publishedYes

Fingerprint

control systems design
Gallium arsenide
menisci
thermal stresses
Crystal growth
heaters
Thermal stress
crystals
gallium
controllers
disturbances
Systems analysis
Control systems
requirements
Controllers
Crystals
gallium arsenide

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Advanced control design considerations for the Czochralski process. / Gevelber, Michael A.; Wargo, Michael J.; Stephanopoulos, George.

In: Journal of Crystal Growth, Vol. 85, No. 1-2, 01.11.1987, p. 256-263.

Research output: Contribution to journalArticle

Gevelber, Michael A. ; Wargo, Michael J. ; Stephanopoulos, George. / Advanced control design considerations for the Czochralski process. In: Journal of Crystal Growth. 1987 ; Vol. 85, No. 1-2. pp. 256-263.
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