TY - JOUR
T1 - Absolute measurement of normalized thickness, t/λi, from off-axis electron holography
AU - McCartney, Martha
AU - Gajdardziska-Josifovska, M.
N1 - Funding Information:
This work was performed in the Center for High Resolution Electron Microscopy at Arizona State University supported by NSF Grant DMR-91-15680. We are grateful to Drs. P.A. Crozier, M.R. Scheinfein and D.J. Smith for stimulating discussions and comments on the manuscript.
PY - 1994/3
Y1 - 1994/3
N2 - A simple method is described for determination of the quantity t/λi from off-axis electron holograms, where t is the local thickness and λi is the mean-free-path for inelastic scattering of high energy electrons. The method uses the energy-filtered amplitude reconstructed from a hologram and, when applied to samples with well characterized geometry, allows measurement of the inelastic mean-free-path. Measured values of 71 ± 5 nm for MgO and 92 ± 7 nm for Si for 100 keV beam energy compare favorably with calculated and experimental values from electron-energy-loss spectroscopy. Differences between the two techniques for determining t/λi and the utility of the holographic method are briefly discussed.
AB - A simple method is described for determination of the quantity t/λi from off-axis electron holograms, where t is the local thickness and λi is the mean-free-path for inelastic scattering of high energy electrons. The method uses the energy-filtered amplitude reconstructed from a hologram and, when applied to samples with well characterized geometry, allows measurement of the inelastic mean-free-path. Measured values of 71 ± 5 nm for MgO and 92 ± 7 nm for Si for 100 keV beam energy compare favorably with calculated and experimental values from electron-energy-loss spectroscopy. Differences between the two techniques for determining t/λi and the utility of the holographic method are briefly discussed.
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U2 - 10.1016/0304-3991(94)90040-X
DO - 10.1016/0304-3991(94)90040-X
M3 - Article
AN - SCOPUS:0028399154
SN - 0304-3991
VL - 53
SP - 283
EP - 289
JO - Ultramicroscopy
JF - Ultramicroscopy
IS - 3
ER -