Abstract
In this paper we report a spiking-resistant all-Al rear junction n-type monocrystalline Si solar cell with an efficiency of 18%. This 1×1 inch2 cell is fabricated by ionic liquid based electroplating of Al as the front electrode on an n-type Si solar cell with screen-printed Al as the rear junction. Partially-processed cells are prepared in an industrial R&D line of Canadian Solar. The cells are patterned by photolithography to open the front contact. A seed layer of Ni is deposited by sputtering to assist Al electroplating. A finished cell is annealed at different temperatures from 150-450°C to evaluate the effect of temperature on its performance. Compared to a p-type all-Al cell we reported before, the n-type all-Al cell is more resistant to high temperature Al spiking. Further comparison between this cell which has an electroplated Al front electrode and control cells with a screen-printed Ag front electrode demonstrates the feasibility of replacing Ag with electroplated Al as the front electrode.
Original language | English (US) |
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Title of host publication | 2016 IEEE 43rd Photovoltaic Specialists Conference, PVSC 2016 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 2986-2989 |
Number of pages | 4 |
Volume | 2016-November |
ISBN (Electronic) | 9781509027248 |
DOIs | |
State | Published - Nov 18 2016 |
Event | 43rd IEEE Photovoltaic Specialists Conference, PVSC 2016 - Portland, United States Duration: Jun 5 2016 → Jun 10 2016 |
Other
Other | 43rd IEEE Photovoltaic Specialists Conference, PVSC 2016 |
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Country/Territory | United States |
City | Portland |
Period | 6/5/16 → 6/10/16 |
Keywords
- aluminum electroplating
- aluminum spiking
- back emitter
- back junction
- shunting
- silicon solar cell
ASJC Scopus subject areas
- Control and Systems Engineering
- Industrial and Manufacturing Engineering
- Electrical and Electronic Engineering