A robust finite-point based gate model considering process variations

Alex Mitev; Dinesh Ganesan; Dheepan Shanmugasundaram; Yu Cao; Janet M. Wang

doi:10.1109/ICCAD.2007.4397346

A robust finite-point based gate model considering process variations

Alex Mitev, Dinesh Ganesan, Dheepan Shanmugasundaram, Yu Cao, Janet M. Wang

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

5 Scopus citations

Abstract

This paper proposes a robust gate model based on a finite-point modeling scheme. With current source model (CSM) framework, a robust, finite-point gate model is constructed. The new model depends on the selective points of I-V curves of gates. Thus, it implicitly incorporates the variation related parameters into finite points. In addition, to provide good accuracy on output waveform, the new model creates the input and output capacitance elements as nonlinear dependency on input/output waveform and process variation parameters. Experimental results show that the generated gate model has less than 3.7% error at mean, less than 6.2% error at variance and less than 5.8% at 90% percentile for cumulative density functions (CDFs).

Original language	English (US)
Title of host publication	2007 IEEE/ACM International Conference on Computer-Aided Design, ICCAD
Pages	692-697
Number of pages	6
DOIs	https://doi.org/10.1109/ICCAD.2007.4397346
State	Published - 2007
Event	2007 IEEE/ACM International Conference on Computer-Aided Design, ICCAD - San Jose, CA, United States Duration: Nov 4 2007 → Nov 8 2007

Publication series

Name	IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD
ISSN (Print)	1092-3152

Other

Other	2007 IEEE/ACM International Conference on Computer-Aided Design, ICCAD
Country/Territory	United States
City	San Jose, CA
Period	11/4/07 → 11/8/07

ASJC Scopus subject areas

Software
Computer Science Applications
Computer Graphics and Computer-Aided Design

Access to Document

10.1109/ICCAD.2007.4397346

Cite this

Mitev, A., Ganesan, D., Shanmugasundaram, D., Cao, Y., & Wang, J. M. (2007). A robust finite-point based gate model considering process variations. In 2007 IEEE/ACM International Conference on Computer-Aided Design, ICCAD (pp. 692-697). Article 4397346 (IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD). https://doi.org/10.1109/ICCAD.2007.4397346

A robust finite-point based gate model considering process variations. / Mitev, Alex; Ganesan, Dinesh; Shanmugasundaram, Dheepan et al.
2007 IEEE/ACM International Conference on Computer-Aided Design, ICCAD. 2007. p. 692-697 4397346 (IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Mitev, A, Ganesan, D, Shanmugasundaram, D, Cao, Y & Wang, JM 2007, A robust finite-point based gate model considering process variations. in 2007 IEEE/ACM International Conference on Computer-Aided Design, ICCAD., 4397346, IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD, pp. 692-697, 2007 IEEE/ACM International Conference on Computer-Aided Design, ICCAD, San Jose, CA, United States, 11/4/07. https://doi.org/10.1109/ICCAD.2007.4397346

@inproceedings{8ae16beac0ee44d79df484f964f482bd,

title = "A robust finite-point based gate model considering process variations",

abstract = "This paper proposes a robust gate model based on a finite-point modeling scheme. With current source model (CSM) framework, a robust, finite-point gate model is constructed. The new model depends on the selective points of I-V curves of gates. Thus, it implicitly incorporates the variation related parameters into finite points. In addition, to provide good accuracy on output waveform, the new model creates the input and output capacitance elements as nonlinear dependency on input/output waveform and process variation parameters. Experimental results show that the generated gate model has less than 3.7% error at mean, less than 6.2% error at variance and less than 5.8% at 90% percentile for cumulative density functions (CDFs).",

author = "Alex Mitev and Dinesh Ganesan and Dheepan Shanmugasundaram and Yu Cao and Wang, {Janet M.}",

year = "2007",

doi = "10.1109/ICCAD.2007.4397346",

language = "English (US)",

isbn = "1424413826",

series = "IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD",

pages = "692--697",

booktitle = "2007 IEEE/ACM International Conference on Computer-Aided Design, ICCAD",

note = "2007 IEEE/ACM International Conference on Computer-Aided Design, ICCAD ; Conference date: 04-11-2007 Through 08-11-2007",

}

TY - GEN

T1 - A robust finite-point based gate model considering process variations

AU - Mitev, Alex

AU - Ganesan, Dinesh

AU - Shanmugasundaram, Dheepan

AU - Cao, Yu

AU - Wang, Janet M.

PY - 2007

Y1 - 2007

N2 - This paper proposes a robust gate model based on a finite-point modeling scheme. With current source model (CSM) framework, a robust, finite-point gate model is constructed. The new model depends on the selective points of I-V curves of gates. Thus, it implicitly incorporates the variation related parameters into finite points. In addition, to provide good accuracy on output waveform, the new model creates the input and output capacitance elements as nonlinear dependency on input/output waveform and process variation parameters. Experimental results show that the generated gate model has less than 3.7% error at mean, less than 6.2% error at variance and less than 5.8% at 90% percentile for cumulative density functions (CDFs).

AB - This paper proposes a robust gate model based on a finite-point modeling scheme. With current source model (CSM) framework, a robust, finite-point gate model is constructed. The new model depends on the selective points of I-V curves of gates. Thus, it implicitly incorporates the variation related parameters into finite points. In addition, to provide good accuracy on output waveform, the new model creates the input and output capacitance elements as nonlinear dependency on input/output waveform and process variation parameters. Experimental results show that the generated gate model has less than 3.7% error at mean, less than 6.2% error at variance and less than 5.8% at 90% percentile for cumulative density functions (CDFs).

UR - http://www.scopus.com/inward/record.url?scp=49749089291&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=49749089291&partnerID=8YFLogxK

U2 - 10.1109/ICCAD.2007.4397346

DO - 10.1109/ICCAD.2007.4397346

M3 - Conference contribution

AN - SCOPUS:49749089291

SN - 1424413826

SN - 9781424413829

T3 - IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD

SP - 692

EP - 697

BT - 2007 IEEE/ACM International Conference on Computer-Aided Design, ICCAD

T2 - 2007 IEEE/ACM International Conference on Computer-Aided Design, ICCAD

Y2 - 4 November 2007 through 8 November 2007

ER -

A robust finite-point based gate model considering process variations

Abstract

Publication series

Other

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this