@article{87abca87307845488a69ee8d997889e5,
title = "A robust co-sputtering fabrication procedure for TiNi shape memory alloys for MEMS",
abstract = "Co-sputtering has been used to fabricate equiatomic thin films of TiNi, a shape memory alloy which form the basis of microactuators with many applications in MEMS. Methods for overcoming the difficulties involved in obtaining equiatomic TiNi thin films with high transformation temperatures, and a robust procedure suitable for batch fabrication in a production environment, are described.",
keywords = "Microactuators, Shape-memory alloys, Sputtering, TiNi",
author = "Shih, {Chen Luen} and Lai, {Bo Kuai} and Harold Kahn and Phillips, {Stephen M.} and Heuer, {Arthur H.}",
note = "Funding Information: Manuscript received June 16, 2000; revised November 20, 2000. This work was supported by the Glennan Microsystems Initiative and by DARPA under DAAN 02-98-C-4024. Subject Editor, O. Tabata. C.-L. Shih, B.-K. Lai, H. Kahn, and A. H. Heuer are with the Department of Materials Science and Engineering, Case Western Reserve University, Cleveland, OH 44106-7204 USA (e-mail: hxk29@cwru.edu). S. M. Phillips is with the Department of Electrical Engineering and Computer Science, Case Western Reserve University, Cleveland, OH 44106-7204 USA. Publisher Item Identifier S 1057-7157(01)02059-5.",
year = "2001",
month = mar,
doi = "10.1109/84.911094",
language = "English (US)",
volume = "10",
pages = "69--79",
journal = "Journal of Microelectromechanical Systems",
issn = "1057-7157",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "1",
}