A novel technique for performing PID susceptibility screening during the solar cell fabrication process

Jaewon Oh, Som Dahal, Bill Dauksher, Stuart Bowden, Govindasamy Tamizhmani, Peter Hacke

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

Various characterization techniques have historically been developed in order to screen potential induced degradation (PID)-susceptible cells, but those techniques require final solar cells. We present a new characterization technique for screening PID-susceptible cells during the cell fabrication process. Illuminated Lock-In Thermography (ILIT) was used to image PID shunting of the cell without metallization and clearly showed PID-affected areas. PID-susceptible cells can be screened by ILIT, and the sample structure can advantageously be simplified as long as the sample has the silicon nitride antireflection coating and an aluminum back surface field.

Original languageEnglish (US)
Title of host publication2017 IEEE 44th Photovoltaic Specialist Conference, PVSC 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1245-1247
Number of pages3
ISBN (Electronic)9781509056057
DOIs
StatePublished - 2017
Event44th IEEE Photovoltaic Specialist Conference, PVSC 2017 - Washington, United States
Duration: Jun 25 2017Jun 30 2017

Publication series

Name2017 IEEE 44th Photovoltaic Specialist Conference, PVSC 2017

Other

Other44th IEEE Photovoltaic Specialist Conference, PVSC 2017
Country/TerritoryUnited States
CityWashington
Period6/25/176/30/17

Keywords

  • Electroluminescence
  • Lock-in thermography
  • PID
  • Photovoltaic cells
  • Reliability
  • Silicon

ASJC Scopus subject areas

  • Renewable Energy, Sustainability and the Environment
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

Fingerprint

Dive into the research topics of 'A novel technique for performing PID susceptibility screening during the solar cell fabrication process'. Together they form a unique fingerprint.

Cite this