A nanocontact printing system for sub-100nm aligned patterning

Bharath R. Takulapalli, Michael E. Morrison, Jian Gu, Peiming Zhang

Research output: Contribution to journalArticle

7 Scopus citations

Abstract

Though many aspects of contact printing have been explored extensively since its invention, there are still hurdles to overcome for multilayer printing in the nanometer regime. Here we report on an aligned nanocontact printing (nCP) system that has demonstrated a sub-100nm alignment capability by means of moiré fringes and microspacers. To address issues in the stamp inking, we have devised a microfluidic apparatus based on the gradient capillary force for transport of ink solutions. The nCP system has been tested by printing nucleoside phosphoramidites on a nanopillar arrayed substrate. Although the nCP system was designed primarily for use in the fabrication of high density DNA nanoarrays, it has the potential to be applied to other fields of nanotechnology for nanoscale patterning.

Original languageEnglish (US)
Article number285302
JournalNanotechnology
Volume22
Issue number28
DOIs
StatePublished - Jul 15 2011

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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    Takulapalli, B. R., Morrison, M. E., Gu, J., & Zhang, P. (2011). A nanocontact printing system for sub-100nm aligned patterning. Nanotechnology, 22(28), [285302]. https://doi.org/10.1088/0957-4484/22/28/285302