A low energy electron beam annealing system: Design, capability and use

M. N. Kozicki, A. R. Dinnis, J. M. Robertson

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The paper discusses how an experimental low energy electron‐beam annealing system may be constructed from SEM components for use in semiconductor research. The system is essentially very simple in design but is adequate for selective transient annealing of areas of bulk materials and features within specially fabricated test integrated circuits. Some experimental results obtained with such a system are detailed to illustrate its use and capabilities.

Original languageEnglish (US)
Pages (from-to)3-7
Number of pages5
JournalScanning
Volume6
Issue number2
DOIs
StatePublished - 1984

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Instrumentation

Fingerprint Dive into the research topics of 'A low energy electron beam annealing system: Design, capability and use'. Together they form a unique fingerprint.

Cite this