The paper discusses how an experimental low energy electron‐beam annealing system may be constructed from SEM components for use in semiconductor research. The system is essentially very simple in design but is adequate for selective transient annealing of areas of bulk materials and features within specially fabricated test integrated circuits. Some experimental results obtained with such a system are detailed to illustrate its use and capabilities.
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics