A kinetic model for Si1-x gex growth from Si H4 and Ge H4 by CVD

Xiaolong Yang, Meng Tao

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

A kinetic model is proposed for silicon-germanium alloy (Si1-x Gex) growth from silane (Si H4) and germane (Ge H4) by chemical vapor deposition. It takes into account both homogeneous and heterogeneous reactions, which involve the precursors (Si H4 and Ge H4) and the homogeneous decomposition product of germane, germylene (Ge H2), and three types of surface sites: silicon sites, hydrogen-terminated silicon sites, and germanium sites. The growth of Si1-x Gex can be divided into two regimes: a heterogeneous decomposition dominated regime and a homogeneous decomposition dominated regime. For the heterogeneous regime, analytical equations based on the collision theory of heterogeneous unimolecular reactions, statistical physics, and the concept of competitive adsorption are derived to quantitatively describe growth rate and film composition as a function of deposition conditions, including deposition temperature, silane flow rate, and germane flow rate. Homogeneous decomposition of germane into germylene complicates the gas phase chemistry for both germane and silane, and an empirical linear relation is employed to describe the growth behavior in the homogeneous regime. The model agrees well with the experimental data by Jang [J. Electrochem. Soc. 142, 3513 (1995)].

Original languageEnglish (US)
JournalJournal of the Electrochemical Society
Volume154
Issue number1
DOIs
StatePublished - 2007
Externally publishedYes

Fingerprint

Silanes
Chemical vapor deposition
vapor deposition
silanes
Decomposition
decomposition
Kinetics
kinetics
Silicon
flow velocity
Flow rate
germanium alloys
Germanium
silicon alloys
silicon
Hydrogen
germanium
Physics
Gases
chemistry

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

A kinetic model for Si1-x gex growth from Si H4 and Ge H4 by CVD. / Yang, Xiaolong; Tao, Meng.

In: Journal of the Electrochemical Society, Vol. 154, No. 1, 2007.

Research output: Contribution to journalArticle

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